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TWI265979B - Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process - Google Patents

Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process

Info

Publication number
TWI265979B
TWI265979B TW93137588A TW93137588A TWI265979B TW I265979 B TWI265979 B TW I265979B TW 93137588 A TW93137588 A TW 93137588A TW 93137588 A TW93137588 A TW 93137588A TW I265979 B TWI265979 B TW I265979B
Authority
TW
Taiwan
Prior art keywords
chemical vapor
vapor deposition
photo chemical
deposition machine
chamber
Prior art date
Application number
TW93137588A
Other languages
Chinese (zh)
Other versions
TW200619417A (en
Inventor
Fu-Hsiang Yang
Hsin-Chen Lee
Chih-Hao Wu
Li-Tien Huang
Wen-Zheng Chiu
Original Assignee
Ritdisplay Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ritdisplay Corp filed Critical Ritdisplay Corp
Priority to TW93137588A priority Critical patent/TWI265979B/en
Publication of TW200619417A publication Critical patent/TW200619417A/en
Application granted granted Critical
Publication of TWI265979B publication Critical patent/TWI265979B/en

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  • Chemical Vapour Deposition (AREA)

Abstract

A photo chemical vapor deposition machine comprising a light source and a chamber having a wall and a substrate carrier. The light source is disposed outside the chamber. The radiation emitted by the light source is passed through the wall of the chamber into the chamber. The photo chemical vapor deposition machine further comprises a plasma generator connecting to the chamber. The photo chemical vapor deposition machine of this invention can complete the deposition process and removal process of films in the chamber thereof so that the photo chemical vapor deposition machine can save the process time and cost.
TW93137588A 2004-12-06 2004-12-06 Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process TWI265979B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93137588A TWI265979B (en) 2004-12-06 2004-12-06 Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93137588A TWI265979B (en) 2004-12-06 2004-12-06 Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process

Publications (2)

Publication Number Publication Date
TW200619417A TW200619417A (en) 2006-06-16
TWI265979B true TWI265979B (en) 2006-11-11

Family

ID=38191450

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93137588A TWI265979B (en) 2004-12-06 2004-12-06 Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process

Country Status (1)

Country Link
TW (1) TWI265979B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399455B (en) * 2009-10-21 2013-06-21 Au Optronics Corp Chemical vapor deposition equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399455B (en) * 2009-10-21 2013-06-21 Au Optronics Corp Chemical vapor deposition equipment

Also Published As

Publication number Publication date
TW200619417A (en) 2006-06-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees