[go: up one dir, main page]

TW201300177A - Ultraviolet irradiation device - Google Patents

Ultraviolet irradiation device Download PDF

Info

Publication number
TW201300177A
TW201300177A TW101122829A TW101122829A TW201300177A TW 201300177 A TW201300177 A TW 201300177A TW 101122829 A TW101122829 A TW 101122829A TW 101122829 A TW101122829 A TW 101122829A TW 201300177 A TW201300177 A TW 201300177A
Authority
TW
Taiwan
Prior art keywords
gas
casing
ultraviolet lamp
ultraviolet
irradiation device
Prior art date
Application number
TW101122829A
Other languages
Chinese (zh)
Inventor
片桐毅
廣井和則
Original Assignee
傑士湯淺國際股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 傑士湯淺國際股份有限公司 filed Critical 傑士湯淺國際股份有限公司
Publication of TW201300177A publication Critical patent/TW201300177A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/30Vessels; Containers
    • H01J61/35Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
    • H10P76/204

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

本發明藉由提高收納紫外線燈的箱體內的氣體置換效率,來縮短氣體置換時間,並且減少該置換中的氣體使用量。本發明的紫外線照射裝置包括:紫外線燈2,對工件W照射紫外線;箱體3,收納紫外線燈2,具有與工件W相對向地形成開口的開口部31;及氣體供給機構4,將氣體供給至箱體3內;且於箱體3的內表面或內部空間,設置有用以使藉由氣體供給機構4所供給的氣體在紫外線燈2的周圍朝一個方向循環的循環導引面3x。According to the present invention, the gas replacement efficiency in the casing in which the ultraviolet lamp is housed is improved, the gas replacement time is shortened, and the amount of gas used in the replacement is reduced. The ultraviolet irradiation device of the present invention includes an ultraviolet lamp 2 that irradiates the workpiece W with ultraviolet rays, a case 3 that houses the ultraviolet lamp 2, an opening 31 that forms an opening facing the workpiece W, and a gas supply mechanism 4 that supplies the gas. To the inside of the casing 3, and on the inner surface or the inner space of the casing 3, a circulation guide surface 3x for circulating the gas supplied from the gas supply mechanism 4 in one direction around the ultraviolet lamp 2 is provided.

Description

紫外線照射裝置 Ultraviolet irradiation device

本發明是有關於一種紫外線照射裝置。 The present invention relates to an ultraviolet irradiation device.

先前,為了淨化基板等工件(work)的表面,一直使用對工件的表面照射紫外線使表面上的有機物氧化分解的紫外線照射裝置。 Conventionally, in order to purify the surface of a workpiece such as a substrate, an ultraviolet irradiation device that irradiates the surface of the workpiece with ultraviolet rays to oxidize and decompose the organic substances on the surface has been used.

此處,自紫外線燈射出的例如波長172 nm的紫外線會被環境中的氧分子吸收。具體而言,波長172 nm的紫外線在大氣中僅前進2 mm即衰減30%~40%左右。因此,如專利文獻1及專利文獻2等所示,使收納紫外線燈的箱體(casing)(燈箱)內充滿例如氮氣(N2)等惰性氣體,並且用惰性氣體充滿紫外線燈與工件之間。藉由如此用惰性氣體充滿紫外線燈的周圍環境,來防止自紫外線燈射出的紫外線的衰減,使紫外線對工件的照射效率提高,藉此實現工件清洗效率的提高。 Here, ultraviolet rays such as 172 nm emitted from an ultraviolet lamp are absorbed by oxygen molecules in the environment. Specifically, ultraviolet rays having a wavelength of 172 nm are only about 2 mm in the atmosphere, that is, attenuated by about 30% to 40%. Therefore, as shown in Patent Document 1 and Patent Document 2, the casing (light box) in which the ultraviolet lamp is housed is filled with an inert gas such as nitrogen (N 2 ), and the inert gas is used to fill the gap between the ultraviolet lamp and the workpiece. . By filling the surrounding environment of the ultraviolet lamp with an inert gas in this manner, the attenuation of the ultraviolet light emitted from the ultraviolet lamp is prevented, and the irradiation efficiency of the ultraviolet light to the workpiece is improved, thereby improving the cleaning efficiency of the workpiece.

然而,於上述專利文獻1及專利文獻2所示的紫外線照射裝置中,存在如下問題:由於自形成大致長方體形狀的箱體的上表面向下供給惰性氣體,或自燈箱的側面朝橫向供給惰性氣體,故置換燈箱內的惰性氣體耗費時間。並且,上述紫外線照射裝置中存在如下問題:不僅難以置換滯留於燈箱內的角部的氣體,而且於紫外線燈中與惰性氣體導入口相反之側的空間內難以產生氣體置換,直至置換結束前所使用的惰性氣體的供給量亦增加。 However, in the ultraviolet irradiation device described in Patent Document 1 and Patent Document 2, there is a problem in that an inert gas is supplied downward from the upper surface of the casing which is formed in a substantially rectangular parallelepiped shape, or is supplied in the lateral direction from the side of the light box. Gas, so replacing the inert gas in the light box takes time. Further, in the above-described ultraviolet irradiation device, it is difficult to replace the gas remaining in the corner portion of the light box, and it is difficult to generate gas replacement in the space on the side opposite to the inert gas introduction port of the ultraviolet lamp until the end of the replacement. The amount of inert gas supplied is also increased.

並且,上述紫外線照射裝置亦存在如下問題:為使箱體內為惰性環境,必需利用透光窗使設置於箱體的紫外線照射側的開口部密閉,且為使透光窗與工件之間的空間為惰性氣體環境,必需設置第2氣體供給機構,或於透光窗與箱體之間開設縫隙,設置將箱體內的氣體朝工件側導入的機構,從而零件個數增多。 Further, the ultraviolet irradiation device has a problem that it is necessary to seal the opening provided on the ultraviolet irradiation side of the casing by the light transmission window in order to make the space inside the casing inert, and to make the space between the light transmission window and the workpiece In the inert gas atmosphere, it is necessary to provide a second gas supply mechanism, or to open a gap between the light transmission window and the casing, and to provide a mechanism for introducing the gas in the casing toward the workpiece side, and the number of parts is increased.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2009-268974號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-268974

專利文獻2:日本專利特開2010-125368號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2010-125368

因此,本發明是為了一舉解決上述問題而完成的,其主要預期課題是藉由提高收納紫外線燈的箱體內的氣體置換效率,來縮短氣體置換時間,並且減少該置換中的氣體使用量。 Accordingly, the present invention has been made to solve the above problems in one fell swoop, and its main intended problem is to shorten the gas replacement time and reduce the amount of gas used in the replacement by increasing the gas replacement efficiency in the casing in which the ultraviolet lamp is housed.

即,本發明的紫外線照射裝置的特徵在於包括:紫外線燈,對工件照射紫外線;箱體,收納上述紫外線燈,具有與上述工件相對向地形成開口的開口部;及氣體供給機構,將氣體供給至上述箱體內;且於上述箱體的內表面或內部空間,設置有用以使藉由上述氣體供給機構所供給的氣體在上述紫外線燈的周圍朝一個方向循環的循環導引面。 In other words, the ultraviolet irradiation device of the present invention includes: an ultraviolet lamp that irradiates the workpiece with ultraviolet rays; a case that houses the ultraviolet lamp, has an opening that opens toward the workpiece, and a gas supply mechanism that supplies the gas The inner surface of the casing or the inner space is provided with a circulation guide surface for circulating a gas supplied from the gas supply mechanism in one direction around the ultraviolet lamp.

若為此種紫外線照射裝置,則由於藉由氣體供給機構所供給的氣體沿著設置於箱體的內表面或內部空間的循環 導引面在紫外線燈的周圍朝一個方向循環,故可提高箱體內的氣體置換效率。藉此,可縮短箱體內的氣體置換時間,並且減少氣體的使用量。由於可減少氣體的使用量,故可削減紫外線照射裝置的運轉費用(running cost)之中被認為佔1/3~1/2的氣體費用。 In the case of such an ultraviolet ray irradiation device, the gas supplied by the gas supply mechanism circulates along the inner surface or the inner space provided in the casing The guiding surface circulates in one direction around the ultraviolet lamp, so that the gas replacement efficiency in the tank can be improved. Thereby, the gas replacement time in the tank can be shortened, and the amount of gas used can be reduced. Since the amount of gas used can be reduced, it is considered that the operating cost of the ultraviolet irradiation device is considered to be 1/3 to 1/2 of the gas cost.

並且,本發明的紫外線照射裝置由於使氣體在紫外線燈的周圍循環,故可提高紫外線燈與工件之間的空間(紫外線燈的紫外線照射側的空間)的氣體置換效率。藉此,可擴大紫外線燈與工件的距離,可儘可能擴大利用1個紫外線燈的工件照射範圍。 Further, since the ultraviolet irradiation device of the present invention circulates the gas around the ultraviolet lamp, the gas replacement efficiency of the space between the ultraviolet lamp and the workpiece (the space on the ultraviolet irradiation side of the ultraviolet lamp) can be improved. Thereby, the distance between the ultraviolet lamp and the workpiece can be increased, and the irradiation range of the workpiece using one ultraviolet lamp can be expanded as much as possible.

此外,本發明的紫外線照射裝置亦可藉由使氣體在紫外線燈的周圍循環,來防止白粉附著於紫外線燈上。再者,該白粉是如此而產生:當有機溶劑、酸、鹼等各種化學品經氣化、霧化而懸浮於紫外線燈的環境中時,上述各種化學品接受紫外線照射產生硫酸銨等反應生成物附著於紫外線燈上而產生;除此以外,自正在照射的工件產生的飛散物接觸至燈經再結晶化而產生。由該白粉,會產生如下問題:阻礙紫外線透過,使紫外線強度降低;白粉自紫外線燈剝落,污染工件。 Further, the ultraviolet irradiation device of the present invention can prevent the white powder from adhering to the ultraviolet lamp by circulating the gas around the ultraviolet lamp. Furthermore, the white powder is produced by the following steps: when various chemicals such as organic solvents, acids, and alkalis are vaporized and atomized and suspended in the environment of the ultraviolet lamp, the above various chemicals are subjected to ultraviolet irradiation to generate ammonium sulfate and the like. The object is caused to adhere to the ultraviolet lamp; in addition, the scattering material generated from the workpiece being irradiated is brought into contact with the lamp to be recrystallized. From the white powder, there is a problem that the ultraviolet light is blocked from passing, and the ultraviolet light intensity is lowered; the white powder is peeled off from the ultraviolet lamp to contaminate the workpiece.

理想的是,沿著上述氣體供給機構的氣體供給方向的虛擬線、與該虛擬線及上述箱體的內表面或上述循環導引面的交點上的切線所成的角度為銳角。如此一來,藉由氣體供給機構所供給的氣體在碰上箱體的內表面或循環導引面後,容易沿著該內表面或循環導引面流動而在紫外線燈 的周圍朝一個方向循環。因此,可提高箱體內的氣體置換效率、氣體置換時間的縮短效果及氣體使用量的減少效果。 Preferably, the angle formed by the imaginary line along the gas supply direction of the gas supply means and the tangential line at the intersection of the imaginary line and the inner surface of the casing or the circulation guide surface is an acute angle. In this way, after the gas supplied by the gas supply mechanism hits the inner surface of the casing or the circulation guide surface, it is easy to flow along the inner surface or the circulation guide surface in the ultraviolet lamp. The surroundings circulate in one direction. Therefore, the gas replacement efficiency in the tank, the shortening effect of the gas replacement time, and the effect of reducing the amount of gas used can be improved.

理想的是,上述氣體供給機構朝向與形成於上述箱體內的氣體循環方向相同的方向供給上述氣體。如此一來,藉由氣體供給機構所供給的氣體更進一步容易沿著循環導引面在紫外線燈的周圍朝一個方向循環,從而可更進一步提高箱體內的氣體置換效率、氣體置換時間的縮短效果及氣體使用量的減少效果。 Preferably, the gas supply means supplies the gas in the same direction as the gas circulation direction formed in the casing. In this way, the gas supplied by the gas supply mechanism is further circulated in one direction around the ultraviolet ray lamp along the circulation guide surface, thereby further improving the gas replacement efficiency and the gas replacement time in the tank. And the effect of reducing the amount of gas used.

理想的是,上述循環導引面上的與上述箱體的長度方向垂直的剖面形成大致部分圓形狀、大致部分長圓形狀、大致部分楕圓形狀或角部呈圓弧狀的大致部分矩形狀。如此一來,可使氣體在紫外線燈的周圍循環,可提高箱體內的氣體置換效率,縮短氣體置換時間,並且減少該置換中的氣體使用量。當箱體內表面為大致部分圓形狀或大致部分楕圓形狀時,箱體的整個內表面成為循環導引面;當箱體內表面為大致部分長圓形狀(大致部分跑道(track)形狀)時,箱體內表面的兩側的圓弧部成為循環導引面;當箱體內表面為角部呈圓弧狀的大致部分矩形狀時,箱體內表面的角部的圓弧部成為循環導引面。 Preferably, the cross section perpendicular to the longitudinal direction of the casing on the circulation guide surface is formed in a substantially partial circular shape, a substantially partial oblong shape, a substantially partial conical shape, or a substantially partial rectangular shape in which the corner portions are arcuate. In this way, the gas can be circulated around the ultraviolet lamp, the gas replacement efficiency in the tank can be improved, the gas replacement time can be shortened, and the amount of gas used in the replacement can be reduced. When the inner surface of the box is substantially partially circular or substantially partially rounded, the entire inner surface of the box becomes a circulation guide surface; when the inner surface of the box is substantially partially oblong (substantially part of a track shape), the box The circular arc portion on both sides of the inner surface of the body serves as a circulation guide surface. When the inner surface of the casing has a substantially rectangular shape in which the corner portion has an arc shape, the arc portion of the corner portion of the inner surface of the casing serves as a circulation guide surface.

理想的是,上述紫外線燈形成長條圓筒形狀,上述箱體形成收納上述紫外線燈的長條筒形狀,並且具有沿著上述紫外線燈的長度方向的開口部。如此一來,因紫外線燈為圓筒形狀,故容易使氣體在圍繞著該紫外線燈的軸方向的周圍循環,可更進一步提高箱體內的氣體置換效率。 Preferably, the ultraviolet lamp has a long cylindrical shape, and the casing forms a long cylindrical shape in which the ultraviolet lamp is housed, and has an opening along a longitudinal direction of the ultraviolet lamp. In this way, since the ultraviolet lamp has a cylindrical shape, it is easy to circulate the gas around the axial direction of the ultraviolet lamp, and the gas replacement efficiency in the casing can be further improved.

理想的是,上述氣體供給機構遍及上述箱體的幾乎整個長度方向將氣體供給至上述箱體內。如此一來,於收納形成長條圓筒形狀的紫外線燈的箱體中,可利用氣體高效地填充該紫外線燈的周圍。 Preferably, the gas supply means supplies gas to the casing over substantially the entire length of the casing. In this way, in the case where the ultraviolet lamp having a long cylindrical shape is accommodated, the periphery of the ultraviolet lamp can be efficiently filled with gas.

理想的是,上述氣體供給機構包括:第1供給部,於上述箱體的上部,朝向與形成於上述箱體內的氣體循環方向相同的方向供給氣體;及第2供給部,於上述箱體的開口部,朝向與藉由上述第1供給部所供給的氣體的循環方向相同的方向供給氣體。特別理想的是,第2供給部朝向紫外線燈與工件之間的空間,沿著與藉由第1供給部所供給的氣體的循環方向相同的方向供給氣體。如此一來,自紫外線燈的上側與下側此兩方供給氣體,因此可高效地進行紫外線燈周圍的氣體循環,可提高氣體的置換效率。 Preferably, the gas supply means includes: a first supply unit that supplies a gas in a direction opposite to a gas circulation direction formed in the casing in an upper portion of the casing; and a second supply unit in the casing The opening is supplied with gas in the same direction as the circulation direction of the gas supplied from the first supply unit. It is particularly preferable that the second supply unit supplies the gas in a space between the ultraviolet lamp and the workpiece in the same direction as the circulation direction of the gas supplied from the first supply unit. In this way, since the gas is supplied from both the upper side and the lower side of the ultraviolet lamp, the gas circulation around the ultraviolet lamp can be efficiently performed, and the gas replacement efficiency can be improved.

理想的是,藉由上述氣體供給機構所供給的氣體的循環方向是沿著上述工件的搬送方向的方向。藉由如上所述使循環方向與搬送方向相一致,可更進一步促進氣體循環,而不會因搬送工件而擾亂氣體循環。 Preferably, the circulation direction of the gas supplied by the gas supply means is a direction along the conveying direction of the workpiece. By aligning the circulation direction with the conveyance direction as described above, the gas circulation can be further promoted without disturbing the gas circulation by conveying the workpiece.

當欲儘可能擴大紫外線燈的工件照射區域時,可考慮擴大紫外線燈與工件的距離。此時,可考慮以未遮擋紫外線燈的紫外線照射範圍的方式形成箱體的開口部,並且擴大紫外線燈及箱體與工件的距離。此時,於箱體與工件之間的空間內難以進行氣體的置換。因此,理想的是具有覆蓋(cover)部,該覆蓋部自箱體的開口部向工件側延伸設置,且以未遮擋上述紫外線燈的紫外線照射範圍的方式覆 蓋上述工件。 When it is desired to expand the irradiation area of the workpiece of the ultraviolet lamp as much as possible, it is conceivable to increase the distance between the ultraviolet lamp and the workpiece. At this time, it is conceivable to form the opening of the casing so as not to block the ultraviolet irradiation range of the ultraviolet lamp, and to enlarge the distance between the ultraviolet lamp and the casing and the workpiece. At this time, it is difficult to replace the gas in the space between the casing and the workpiece. Therefore, it is preferable to have a cover portion that extends from the opening of the casing toward the workpiece side and that covers the ultraviolet irradiation range that does not block the ultraviolet lamp. Cover the above workpiece.

並且,作為氣體供給機構供給至箱體內的氣體,可考慮使用惰性氣體或製程氣體(process gas)。此處,所謂製程氣體,是用以抑制紫外線的吸收,並且有效率地進行工件處理的氣體,例如為氮氣等惰性氣體與氧氣等的混合氣體。 Further, as the gas supplied to the tank as the gas supply means, an inert gas or a process gas can be considered. Here, the process gas is a gas for suppressing absorption of ultraviolet rays and efficiently processing the workpiece, and is, for example, a mixed gas of an inert gas such as nitrogen gas and oxygen gas.

根據如上所述構成的本發明,藉由提高收納紫外線燈的箱體內的氣體置換效率,可縮短氣體置換時間,並且減少該置換中的氣體使用量。 According to the present invention configured as described above, by increasing the gas replacement efficiency in the casing in which the ultraviolet lamp is housed, the gas replacement time can be shortened, and the amount of gas used in the replacement can be reduced.

以下參照圖式,就本發明的紫外線照射裝置的一實施形態進行說明。 An embodiment of the ultraviolet irradiation device of the present invention will be described below with reference to the drawings.

本實施形態的紫外線照射裝置100是用於對液晶顯示器用的玻璃基板或半導體裝置用的半導體基板等工件W照射紫外線而對工件W的表面進行清洗的基板清洗裝置中。 The ultraviolet irradiation device 100 of the present embodiment is used in a substrate cleaning apparatus for irradiating a workpiece such as a glass substrate for a liquid crystal display or a semiconductor substrate for a semiconductor device with ultraviolet rays to clean the surface of the workpiece W.

具體而言,該紫外線照射裝置100如圖1及圖2所示,包括:紫外線燈2,對設置於下方的工件W照射紫外線;箱體3,收納該紫外線燈2,具有與工件W相對向地朝下方形成開口的開口部31;及氣體供給機構4,沿著該箱體3的內表面將氮氣(N2)等惰性氣體供給至箱體3內。再者,藉由未圖示的搬送機構,於紫外線照射裝置100的下方,沿著圖1的箭頭S(與紫外線照射裝置100的長度方 向正交的方向,圖2中為紙面上自左向右的方向)搬送工件W。 Specifically, as shown in FIGS. 1 and 2, the ultraviolet irradiation device 100 includes an ultraviolet lamp 2 that irradiates ultraviolet rays to the workpiece W provided below, and a casing 3 that accommodates the ultraviolet lamp 2 and has a direction opposite to the workpiece W. The opening portion 31 having an opening downward is formed; and the gas supply mechanism 4 supplies an inert gas such as nitrogen (N 2 ) to the inside of the casing 3 along the inner surface of the casing 3. Further, the conveyance mechanism (not shown) is located below the ultraviolet irradiation device 100 along the arrow S of FIG. 1 (the direction orthogonal to the longitudinal direction of the ultraviolet irradiation device 100, and the left side of the paper surface in FIG. 2). The workpiece W is transported in the right direction.

紫外線燈2是例如射出波長172 nm的真空紫外線的準分子燈(excimer lamp)。具體而言,該紫外線燈2如圖1所示,形成長條圓筒形狀,且如圖2所示,於合成石英玻璃製的與軸方向正交的剖面呈圓形狀的密閉容器內填充有例如氙氣(Xe)等放電用氣體,自軸方向觀察,於左右一對的對向面上設置有包含金屬薄膜的帶狀電極21、22。而且,紫外線燈2的兩端部嵌入並保持於設置在箱體3內部的保持體5的貫通孔(未圖示)內,並且紫外線燈2透過該保持體5被施加電壓而點亮,自成對的帶狀電極21、22之間朝上下射出紫外線。再者,將自成對的帶狀電極21、22之間朝下射出的紫外線照射至工件W。並且,為了有效利用自紫外線燈2照射的紫外線,亦可於紫外線燈2的內表面上側或外表面上側設置反射紫外線之層。 The ultraviolet lamp 2 is, for example, an excimer lamp that emits vacuum ultraviolet rays having a wavelength of 172 nm. Specifically, as shown in FIG. 1 , the ultraviolet lamp 2 is formed into a long cylindrical shape, and as shown in FIG. 2 , is filled in a sealed container made of synthetic quartz glass and having a circular cross section perpendicular to the axial direction. For example, a gas for discharge such as Xenon (Xe) is provided, and the strip electrodes 21 and 22 including a metal thin film are provided on a pair of right and left opposing surfaces as viewed from the axial direction. Further, both end portions of the ultraviolet lamp 2 are fitted and held in a through hole (not shown) provided in the holder 5 inside the casing 3, and the ultraviolet lamp 2 is applied with a voltage by the holder 5 to be lit. The pair of strip electrodes 21 and 22 emit ultraviolet rays upward and downward. Further, ultraviolet rays emitted downward from between the pair of strip electrodes 21 and 22 are irradiated to the workpiece W. Further, in order to effectively use the ultraviolet rays irradiated from the ultraviolet lamp 2, a layer that reflects ultraviolet rays may be provided on the upper side or the upper side of the inner surface of the ultraviolet lamp 2.

箱體3形成長條筒形狀,於該箱體3的內部,以使箱體3的軸方向(長度方向)與紫外線燈2的軸方向(長度方向)成為平行的方式收納紫外線燈2。並且,形成於箱體3下方的開口部31是沿著紫外線燈2的軸方向形成,且以自軸方向觀察未遮擋紫外線燈2的紫外線照射範圍A的方式形成。再者,紫外線燈2的紫外線照射範圍A如圖2所示,是以將成對的帶狀電極21、22的下端與紫外線燈2的中心連結而成的角作為中心角的範圍。 The casing 3 is formed into a long tubular shape, and the ultraviolet lamp 2 is housed in the inside of the casing 3 such that the axial direction (longitudinal direction) of the casing 3 is parallel to the axial direction (longitudinal direction) of the ultraviolet lamp 2. Further, the opening 31 formed under the casing 3 is formed along the axial direction of the ultraviolet lamp 2, and is formed so as to obstruct the ultraviolet irradiation range A of the ultraviolet lamp 2 from the axial direction. In addition, as shown in FIG. 2, the ultraviolet irradiation range A of the ultraviolet lamp 2 is a range in which the angle formed by connecting the lower ends of the pair of strip electrodes 21 and 22 and the center of the ultraviolet lamp 2 as a central angle.

並且,以具有循環導引面3x的方式構成箱體3的內表 面,該循環導引面3x用以使藉由氣體供給機構4所供給的惰性氣體在紫外線燈2的周圍朝一個方向循環。更詳細而言,如圖2所示,與箱體3的內表面的長度方向垂直的剖面形成左右兩端具有部分圓弧部3a、3b的大致部分長圓形狀(大致部分跑道形狀),該左右兩端的部分圓弧部3a、3b作為循環導引面3x發揮作用。如此,箱體3的內表面設為於與長度方向垂直的剖面上不存在如惰性氣體滯留之類的角部的光滑構造。 And, the inner table of the casing 3 is configured in such a manner as to have the circulation guide surface 3x. The circulation guide surface 3x is for circulating the inert gas supplied from the gas supply mechanism 4 in one direction around the ultraviolet lamp 2. More specifically, as shown in FIG. 2, a cross section perpendicular to the longitudinal direction of the inner surface of the casing 3 forms a substantially partial oblong shape (substantially part of the racetrack shape) having the partial arc portions 3a and 3b at the left and right ends, and the left and right sides. The partial arc portions 3a and 3b at both ends function as the circulation guide surface 3x. Thus, the inner surface of the casing 3 is formed in a smooth structure in which a corner portion such as an inert gas is not retained in a cross section perpendicular to the longitudinal direction.

而且,該箱體3具有覆蓋部32a、32b,該覆蓋部32a、32b自該箱體3的開口部31向工件W側延伸設置,以未遮擋紫外線燈2的紫外線照射範圍A的方式覆蓋工件W。該覆蓋部32a、32b是以自開口部31朝向左右分別向外側擴大的方式形成,藉由覆蓋已擴大紫外線燈2與工件W的距離的情況下產生的工件W上的開放空間,來將整個紫外線照射範圍A置換成惰性氣體。再者,自該覆蓋部32a、32b與工件W之間隙,處理工件W所需的少量的氧伴隨著工件W的搬送流入至箱體3內。 Further, the casing 3 has cover portions 32a and 32b which extend from the opening portion 31 of the casing 3 toward the workpiece W side, and cover the workpiece so as not to block the ultraviolet irradiation range A of the ultraviolet lamp 2. W. The cover portions 32a and 32b are formed so as to expand outward from the opening portion 31 toward the right and left, and cover the open space on the workpiece W when the distance between the ultraviolet lamp 2 and the workpiece W is enlarged. The ultraviolet irradiation range A is replaced with an inert gas. Further, a small amount of oxygen required to process the workpiece W from the gap between the covering portions 32a and 32b and the workpiece W flows into the casing 3 along with the conveyance of the workpiece W.

氣體供給機構4在箱體3的上部,遍及箱體3的整個長度方向沿著箱體3的內表面供給惰性氣體。亦即,於與箱體3的長度方向垂直的剖面上,沿著氣體供給機構4的氣體供給方向的虛擬線L1、與該虛擬線L1及箱體3的內表面的交點X上的切線L2所成的角度θ設為銳角,氣體供給機構4沿著與形成於箱體3內的惰性氣體的循環方向R(後述)相同的方向供給惰性氣體。具體而言,氣體供 給機構4設置於箱體3的其中一個(圖2中為右側)部分圓弧部3b,沿著該部分圓弧部3b的內表面的切線方向將惰性氣體供給至箱體3內,且包括氣體導入部411及氣體供給配管412,其中該氣體導入部411與部分圓弧部3b連接並且於部分圓弧部3b的內表面上形成開口,該氣體供給配管412將惰性氣體供給至該氣體導入部411的氣體供給配管412。 The gas supply mechanism 4 supplies an inert gas along the inner surface of the casing 3 over the entire longitudinal direction of the casing 3 at the upper portion of the casing 3. That is, in the cross section perpendicular to the longitudinal direction of the casing 3, the tangential line L2 along the virtual line L1 in the gas supply direction of the gas supply mechanism 4 and the intersection X of the imaginary line L1 and the inner surface of the casing 3 The angle θ formed is an acute angle, and the gas supply mechanism 4 supplies the inert gas in the same direction as the circulation direction R (described later) of the inert gas formed in the casing 3. Specifically, gas supply The mechanism 4 is disposed on one of the right side arc portions 3b of the casing 3 (the right side in FIG. 2), and supplies inert gas to the casing 3 along the tangential direction of the inner surface of the partial arc portion 3b, and includes The gas introduction portion 411 and the gas supply pipe 412 are connected to the partial arc portion 3b and form an opening on the inner surface of the partial arc portion 3b, and the gas supply pipe 412 supplies an inert gas to the gas introduction. The gas supply pipe 412 of the portion 411.

該氣體導入部411沿著長度方向設置於箱體3的部分圓弧部3b。而且,氣體導入部411藉由上下兩塊平板而具有於部分圓弧部3b的內表面上沿著長度方向延伸的1個開口。除此以外,亦可將氣體導入部411形成為藉由將多條管子沿著例如部分圓弧部3b的長度方向以相等間隔連接而具有多個開口的構件。而且,氣體供給配管412與氣體導入部411連接,並且自未圖示的惰性氣體源將惰性氣體供給至氣體導入部411。 The gas introduction portion 411 is provided in a portion of the circular arc portion 3b of the casing 3 along the longitudinal direction. Further, the gas introduction portion 411 has one opening extending in the longitudinal direction on the inner surface of the partial arc portion 3b by the upper and lower flat plates. In addition to this, the gas introduction portion 411 may be formed as a member having a plurality of openings by connecting a plurality of tubes at equal intervals along the longitudinal direction of the partial arc portion 3b, for example. Further, the gas supply pipe 412 is connected to the gas introduction portion 411, and the inert gas is supplied to the gas introduction portion 411 from an inert gas source (not shown).

藉由該氣體供給機構4供給至箱體3內的惰性氣體沿著箱體3的內表面流動。即,自其中一個部分圓弧部3b供給的惰性氣體沿著箱體3的平板部3c的內表面流向另一個部分圓弧部3a,且沿著該部分圓弧部3a的內表面流向紫外線燈2的紫外線射出側(下側)。繼而,已流向紫外線燈2的紫外線射出側的惰性氣體(當存在工件W時沿著工件W的表面)流向其中一個部分圓弧部3b,並沿著該其中一個部分圓弧部3b的內表面自下側向上側流動。以如此方式,形成在紫外線燈2的周圍朝一個方向循環的惰性氣 體流R。該惰性氣體的循環方向R是沿著工件W的搬送方向S的方向,該工件W是藉由搬送機構在箱體3的開口部31的下側搬送。即,於開口部31,惰性氣體自左向右流動,於開口部31的下側,工件W自左向右流動。 The inert gas supplied into the casing 3 by the gas supply mechanism 4 flows along the inner surface of the casing 3. That is, the inert gas supplied from one of the partial arc portions 3b flows along the inner surface of the flat plate portion 3c of the casing 3 toward the other partial arc portion 3a, and flows toward the ultraviolet lamp along the inner surface of the portion of the circular arc portion 3a. 2 ultraviolet light emission side (lower side). Then, the inert gas which has flowed toward the ultraviolet light emitting side of the ultraviolet lamp 2 (the surface along the workpiece W when the workpiece W is present) flows toward one of the partial arc portions 3b, and along the inner surface of the one of the partial arc portions 3b Flows from the lower side to the upper side. In this way, an inert gas that circulates in one direction around the ultraviolet lamp 2 is formed. Body flow R. The circulation direction R of the inert gas is a direction along the conveyance direction S of the workpiece W, and the workpiece W is conveyed to the lower side of the opening 31 of the casing 3 by a conveyance mechanism. That is, in the opening portion 31, the inert gas flows from the left to the right, and the workpiece W flows from the left to the right on the lower side of the opening portion 31.

其次,揭示使用以上述方式構成的紫外線照射裝置100的惰性氣體置換效率的模擬(simulation)結果。再者,作為比較例,揭示在形成長方體形狀的箱體內,呈傾瀉(shower)狀自上部供給惰性氣體的先前的紫外線照射裝置中的置換效率的模擬結果。再者,於本實施形態及比較例中,惰性氣體(N2氣體)的供給流速為1 m/s,開始箱體內的N2氣體置換後10秒後開始搬送工件。圖3(A)、圖3(B)表示N2氣體置換開始後10秒(即將搬送工件前)的箱體內的氮氣濃度,圖4(A)、圖4(B)表示開始搬送工件後的箱體內的氮氣濃度。 Next, a simulation result of the inert gas replacement efficiency using the ultraviolet irradiation device 100 configured as described above is disclosed. In addition, as a comparative example, a simulation result of the displacement efficiency in a conventional ultraviolet irradiation device that supplies an inert gas from the upper portion in a box-shaped box body is disclosed. Further, in the present embodiment and the comparative example, the supply flow rate of the inert gas (N 2 gas) was 1 m/s, and the workpiece was conveyed 10 seconds after the replacement of the N 2 gas in the tank was started. 3(A) and 3(B) show the nitrogen concentration in the tank 10 seconds after the start of the N 2 gas replacement (before the workpiece is conveyed), and FIGS. 4(A) and 4(B) show the start of transporting the workpiece. The concentration of nitrogen in the tank.

如圖3(A)、圖3(B)所示可知,於本實施形態的紫外線照射裝置100中,與先前的紫外線照射裝置相比,於較紫外線燈更下側(紫外線照射側)氮氣濃度升高的時間更短。亦即,可知本實施形態的紫外線照射裝置100與先前的紫外線照射裝置相比,N2氣體的置換效率已得到改善。 As shown in Fig. 3 (A) and Fig. 3 (B), in the ultraviolet irradiation device 100 of the present embodiment, the nitrogen concentration is lower (violet irradiation side) than the ultraviolet irradiation lamp, compared with the conventional ultraviolet irradiation device. The rise time is shorter. That is, it is understood that the ultraviolet irradiation device 100 of the present embodiment has improved the replacement efficiency of the N 2 gas as compared with the conventional ultraviolet irradiation device.

如圖4(A)、圖4(B)所示可知,於本實施形態的紫外線照射裝置100中,由於伴隨著工件的搬送,工件的搬送方向與N2氣體的循環方向相一致,故可促進N2氣體的循環,藉此紫外線燈下側的N2氣體的置換效率得到提昇。 As shown in FIG. 4(A) and FIG. 4(B), in the ultraviolet irradiation device 100 of the present embodiment, the conveyance direction of the workpiece coincides with the circulation direction of the N 2 gas due to the conveyance of the workpiece. The circulation of the N 2 gas is promoted, whereby the replacement efficiency of the N 2 gas on the lower side of the ultraviolet lamp is improved.

根據以上述方式構成的本實施形態的紫外線照射裝置100,沿著箱體3內表面所供給的惰性氣體沿著設置於箱體3內表面上的循環導引面3x在紫外線燈2的周圍朝一個方向循環,故可提高箱體3內的惰性氣體置換效率。由此,可縮短箱體3內的惰性氣體置換時間,並且可減少惰性氣體使用量。由於可減少惰性氣體使用量,故可削減紫外線照射裝置100的運轉費用之中被認為佔1/3~1/2的惰性氣體費用。並且,由於使惰性氣體在紫外線燈2的周圍循環,故可提高紫外線燈2與工件W之間的空間(紫外線燈2的紫外線照射側的空間)的惰性氣體置換效率。由此,可擴大紫外線燈2與工件W的距離,從而可儘可能擴大利用1個紫外線燈2的工件照射範圍。此外,藉由使惰性氣體在紫外線燈2的周圍循環,亦可防止白粉附著於紫外線燈2。而且,藉由使惰性氣體在紫外線燈2的周圍循環,亦可進行紫外線燈2的冷卻。 According to the ultraviolet irradiation device 100 of the present embodiment configured as described above, the inert gas supplied along the inner surface of the casing 3 is formed around the ultraviolet lamp 2 along the circulation guide surface 3x provided on the inner surface of the casing 3. The circulation in one direction can increase the inert gas replacement efficiency in the tank 3. Thereby, the inert gas replacement time in the casing 3 can be shortened, and the amount of inert gas used can be reduced. Since the amount of use of the inert gas can be reduced, it is possible to reduce the cost of the inert gas which is considered to be 1/3 to 1/2 of the operation cost of the ultraviolet irradiation device 100. In addition, since the inert gas is circulated around the ultraviolet lamp 2, the inert gas replacement efficiency of the space between the ultraviolet lamp 2 and the workpiece W (the space on the ultraviolet irradiation side of the ultraviolet lamp 2) can be improved. Thereby, the distance between the ultraviolet lamp 2 and the workpiece W can be increased, and the irradiation range of the workpiece using one ultraviolet lamp 2 can be expanded as much as possible. Further, by circulating the inert gas around the ultraviolet lamp 2, it is possible to prevent the white powder from adhering to the ultraviolet lamp 2. Further, the ultraviolet lamp 2 can be cooled by circulating the inert gas around the ultraviolet lamp 2.

再者,本發明並不限於上述實施形態。 Furthermore, the present invention is not limited to the above embodiment.

例如,如圖5所示,氣體供給機構4亦可包括:第1供給部41,於箱體3的上部,朝向與形成於箱體3內的惰性氣體的循環方向R相同的方向供給氣體;及第2供給部42,於箱體3的開口部31,遍及箱體3的整個長度方向朝向與藉由上述第1供給部41所供給的惰性氣體的循環方向R相同的方向供給惰性氣體。再者,第1供給部41具有與上述實施形態的氣體供給機構4相同的構成。 For example, as shown in FIG. 5, the gas supply mechanism 4 may include a first supply unit 41 that supplies gas in the same direction as the circulation direction R of the inert gas formed in the casing 3 in the upper portion of the casing 3; The second supply unit 42 supplies the inert gas to the opening 31 of the casing 3 in the same longitudinal direction as the circulation direction R of the inert gas supplied from the first supply unit 41 over the entire longitudinal direction of the casing 3. Further, the first supply unit 41 has the same configuration as the gas supply unit 4 of the above-described embodiment.

該第2供給部42設置於箱體3的另一個覆蓋部32a, 自覆蓋部32a向開口部31供給惰性氣體,且包括設置於另一個覆蓋部32a並且於覆蓋部32a上形成開口的氣體導入部421、及將惰性氣體供給至該氣體導入部421的氣體供給配管422。 The second supply unit 42 is provided in the other cover portion 32a of the casing 3, The inert gas is supplied from the cover portion 32a to the opening portion 31, and includes a gas introduction portion 421 provided in the other cover portion 32a and having an opening formed in the cover portion 32a, and a gas supply pipe for supplying an inert gas to the gas introduction portion 421. 422.

該氣體導入部421沿著長度方向設置於箱體3的覆蓋部32a上。再者,圖5中,與第1供給部41同樣地,藉由上下兩塊平板形成有氣體導入部421,但亦可藉由將多條管子例如以相等間隔連接於覆蓋部32a來形成氣體導入部421。而且,氣體供給配管422與氣體導入部421連接,並且自未圖示的惰性氣體源將惰性氣體供給至氣體導入部421。 The gas introduction portion 421 is provided on the covering portion 32a of the casing 3 along the longitudinal direction. In addition, in FIG. 5, similarly to the first supply unit 41, the gas introduction portion 421 is formed by the upper and lower flat plates. However, the gas may be formed by connecting a plurality of tubes to the cover portion 32a at equal intervals, for example. The introduction unit 421. Further, the gas supply pipe 422 is connected to the gas introduction portion 421, and the inert gas is supplied to the gas introduction portion 421 from an inert gas source (not shown).

藉由該第2供給部42而流向開口部31的惰性氣體與藉由第1供給部41所供給的惰性氣體一併流向紫外線燈2的紫外線射出側(下側)。繼而,藉由第2供給部42所供給的惰性氣體與藉由第1供給部所供給的惰性氣體一併沿著其中一個部分圓弧部3a的內表面自下側向上側流動,於紫外線燈2的周圍形成朝一個方向循環的惰性氣體流R。 The inert gas flowing to the opening 31 by the second supply unit 42 flows together with the inert gas supplied from the first supply unit 41 to the ultraviolet light emitting side (lower side) of the ultraviolet lamp 2 . Then, the inert gas supplied from the second supply unit 42 flows along the inner surface of one of the partial arc portions 3a from the lower side to the upper side together with the inert gas supplied from the first supply unit. The periphery of 2 forms an inert gas flow R which circulates in one direction.

並且,作為箱體的剖面形狀,並不限於上述實施形態,亦可如圖6所示,設為形成大致部分圓形狀,且亦可如圖7所示,設為形成大致部分楕圓形狀。於此情況下,箱體3的整個內表面作為循環導引面3x發揮作用,氣體供給機構4沿著箱體3的剖面呈圓形的內表面的切線方向供給惰性氣體。並且,如圖8所示,亦可設為形成角部呈圓弧狀的大致部分矩形狀。於此情況下,箱體3的內表面中,形成 於角部的圓弧部作為循環導引面3x發揮作用。 Further, the cross-sectional shape of the casing is not limited to the above-described embodiment, and as shown in FIG. 6, it may be formed into a substantially partial circular shape, or as shown in FIG. 7, it may be formed into a substantially partial circular shape. In this case, the entire inner surface of the casing 3 functions as the circulation guide surface 3x, and the gas supply mechanism 4 supplies the inert gas along the tangential direction of the circular inner surface of the casing 3 in the cross section. Further, as shown in FIG. 8, it may be formed in a substantially rectangular shape in which the corner portion has an arc shape. In this case, the inner surface of the case 3 is formed The circular arc portion at the corner portion functions as the circulation guide surface 3x.

此外,如圖9所示,亦可不於箱體3上設置覆蓋部而構成,設為於左右的部分圓弧部3a、3b上設置第1供給部41及第2供給部42。 Further, as shown in FIG. 9, the cover portion 3 may not be provided with a cover portion, and the first supply portion 41 and the second supply portion 42 may be provided on the left and right partial arc portions 3a and 3b.

並且,於上述實施形態中,已揭示在箱體3的內表面上設置有循環導引面3x的情況,但除此以外,亦可如圖10所示,於箱體3的內部空間3K內設置循環導引面3x。具體而言,可考慮於箱體3的內部空間3K內,於紫外線燈2的周圍設置內表面上形成有循環導引面3x的導引面形成構件300。如此一來,可一方面將箱體3設為先前的構成,一方面獲得箱體內的氣體置換效率、氣體置換時間的縮短效果及氣體使用量的減少效果。再者,圖10中,表示氣體供給機構4向循環導引面3x供給氣體的情況。 Further, in the above embodiment, the case where the circulation guide surface 3x is provided on the inner surface of the casing 3 has been disclosed, but in addition, as shown in Fig. 10, it may be within the internal space 3K of the casing 3. Set the circulation guide surface 3x. Specifically, it is conceivable that the guide surface forming member 300 in which the circulation guide surface 3x is formed on the inner surface is provided around the ultraviolet lamp 2 in the inner space 3K of the casing 3. In this way, the case 3 can be set to the previous configuration, and on the one hand, the gas replacement efficiency in the case, the shortening effect of the gas replacement time, and the effect of reducing the amount of gas used can be obtained. In addition, FIG. 10 shows a case where the gas supply mechanism 4 supplies a gas to the circulation guide surface 3x.

而且,於上述實施形態中是利用惰性氣體對箱體內進行置換,但亦可使用在惰性氣體中混合對工件的表面處理有效的處理用氣體(例如氧氣)而成的氣體(製程氣體),利用該製程氣體對箱體內進行置換。若為此種裝置,則藉由利用惰性氣體進行完全置換,可防止工件的表面處理效率降低的可能性於未然。 Further, in the above-described embodiment, the inside of the tank is replaced with an inert gas, but a gas (process gas) obtained by mixing a treatment gas (for example, oxygen) effective for surface treatment of the workpiece in an inert gas may be used. The process gas is replaced in the tank. In the case of such a device, it is possible to prevent the surface treatment efficiency of the workpiece from being lowered by completely replacing it with an inert gas.

而且,於上述實施形態中是於箱體內收納1根紫外線燈,但亦可設為配置相互平行配置的多根紫外線燈。除此以外,紫外線燈的外觀形狀並不限於形成長條圓筒形狀,亦可具有其他形狀。而且,紫外線燈並不限於剖面呈圓形狀,除此以外,亦可為剖面呈矩形狀的扁平角筒形,且於 紫外線燈的上下一對平坦面上設置有電極(下側電極為網眼(mesh)狀)。 Further, in the above embodiment, one ultraviolet light lamp is housed in the casing, but a plurality of ultraviolet lamps arranged in parallel with each other may be disposed. In addition to this, the appearance shape of the ultraviolet lamp is not limited to forming a long cylindrical shape, and may have other shapes. Further, the ultraviolet lamp is not limited to a circular shape in cross section, and may be a flat rectangular tube having a rectangular cross section, and Electrodes are provided on a pair of upper and lower flat surfaces of the ultraviolet lamp (the lower electrode is in the form of a mesh).

除此以外,毋庸置言,本發明並不限於上述實施形態,於未脫離其主旨的範圍內可進行各種變形。 In addition, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit and scope of the invention.

2‧‧‧紫外線燈 2‧‧‧UV light

3‧‧‧箱體 3‧‧‧ cabinet

3a、3b‧‧‧部分圓弧部 3a, 3b‧‧‧ part of the arc

3c‧‧‧平板部 3c‧‧‧ flat section

3K‧‧‧內部空間 3K‧‧‧Internal space

3x‧‧‧循環導引面 3x‧‧‧Circular guide surface

4‧‧‧氣體供給機構 4‧‧‧ gas supply mechanism

5‧‧‧保持體 5‧‧‧ Keeping body

21、22‧‧‧帶狀電極 21, 22‧‧‧ strip electrodes

31‧‧‧開口部 31‧‧‧ openings

32a‧‧‧覆蓋部 32a‧‧‧ Coverage

32b‧‧‧覆蓋部 32b‧‧‧ Coverage

41‧‧‧第1供給部 41‧‧‧1st Supply Department

42‧‧‧第2供給部 42‧‧‧2nd Supply Department

100‧‧‧紫外線照射裝置 100‧‧‧UV irradiation device

300‧‧‧導引面形成構件 300‧‧‧ Guide surface forming members

411、421‧‧‧氣體導入部 411, 421‧‧‧ gas introduction

412、422‧‧‧氣體供給配管 412, 422‧‧‧ gas supply piping

A‧‧‧紫外線照射範圍 A‧‧‧UV exposure range

L1‧‧‧虛擬線 L1‧‧‧ virtual line

L2‧‧‧切線 L2‧‧‧ tangent

R‧‧‧循環方向 R‧‧‧Circle direction

S‧‧‧工件的搬送方向 S‧‧‧Working direction of the workpiece

W‧‧‧工件 W‧‧‧Workpiece

X‧‧‧交點 X‧‧‧ intersection

θ‧‧‧角度 Θ‧‧‧ angle

圖1是表示本實施形態的紫外線照射裝置的立體圖。 Fig. 1 is a perspective view showing an ultraviolet irradiation device of the embodiment.

圖2是表示上述實施形態的紫外線照射裝置的剖面圖。 Fig. 2 is a cross-sectional view showing the ultraviolet irradiation device of the embodiment.

圖3(A)、圖3(B)是表示置換開始後10秒後的模擬結果的圖。 3(A) and 3(B) are diagrams showing simulation results 10 seconds after the start of replacement.

圖4(A)、圖4(B)是表示基板搬送後的模擬結果的圖。 4(A) and 4(B) are diagrams showing simulation results after substrate transfer.

圖5是變形實施形態的紫外線照射裝置的剖面圖。 Fig. 5 is a cross-sectional view showing an ultraviolet irradiation apparatus according to a modified embodiment.

圖6是表示箱體的第1變形例的剖面圖。 Fig. 6 is a cross-sectional view showing a first modification of the casing.

圖7是表示箱體的第2變形例的剖面圖。 Fig. 7 is a cross-sectional view showing a second modification of the casing.

圖8是表示箱體的第3變形例的剖面圖。 Fig. 8 is a cross-sectional view showing a third modification of the casing.

圖9是表示箱體的第4變形例的剖面圖。 Fig. 9 is a cross-sectional view showing a fourth modification of the casing.

圖10是表示變形實施形態的紫外線照射裝置的剖面圖。 Fig. 10 is a cross-sectional view showing an ultraviolet irradiation device according to a modified embodiment.

2‧‧‧紫外線燈 2‧‧‧UV light

3‧‧‧箱體 3‧‧‧ cabinet

4‧‧‧氣體供給機構 4‧‧‧ gas supply mechanism

5‧‧‧保持體 5‧‧‧ Keeping body

100‧‧‧紫外線照射裝置 100‧‧‧UV irradiation device

S‧‧‧工件的搬送方向 S‧‧‧Working direction of the workpiece

W‧‧‧工件 W‧‧‧Workpiece

Claims (10)

一種紫外線照射裝置,其特徵在於包括:紫外線燈,對工件照射紫外線;箱體,收納上述紫外線燈,具有與上述工件相對向地形成開口的開口部;及氣體供給機構,將氣體供給至上述箱體內;以及於上述箱體的內表面或內部空間,設置有用以使藉由上述氣體供給機構所供給的氣體在上述紫外線燈的周圍朝一個方向循環的循環導引面。 An ultraviolet irradiation device comprising: an ultraviolet lamp that irradiates ultraviolet rays on a workpiece; a case that houses the ultraviolet lamp, has an opening that forms an opening opposite to the workpiece; and a gas supply mechanism that supplies gas to the case And a circulation guide surface for circulating the gas supplied by the gas supply mechanism in one direction around the ultraviolet lamp in the inner surface or the inner space of the casing. 如申請專利範圍第1項所述之紫外線照射裝置,其中沿著上述氣體供給機構的氣體供給方向的虛擬線、與該虛擬線及上述箱體的內表面或上述循環導引面的交點上的切線所成的角度為銳角。 The ultraviolet irradiation device according to claim 1, wherein a virtual line along a gas supply direction of the gas supply means, an intersection with the virtual line, an inner surface of the case, or the circulation guide surface The angle formed by the tangent is an acute angle. 如申請專利範圍第1項或第2項所述之紫外線照射裝置,其中上述氣體供給機構朝向與形成於上述箱體內的氣體循環方向相同的方向供給上述氣體。 The ultraviolet irradiation device according to the first or second aspect of the invention, wherein the gas supply means supplies the gas in a direction in the same direction as a gas circulation direction formed in the casing. 如申請專利範圍第1項至第3項中任一項所述之紫外線照射裝置,其中上述循環導引面上的與上述箱體的長度方向垂直的剖面為大致部分圓形狀、大致部分長圓形狀、大致部分楕圓形狀或角部呈圓弧狀的大致部分矩形狀。 The ultraviolet irradiation device according to any one of claims 1 to 3, wherein a cross section perpendicular to a longitudinal direction of the casing on the circulation guide surface is a substantially partial circular shape and a substantially partial oblong shape. A substantially partial rectangular shape in which a substantially rounded shape or a corner portion has an arc shape. 如申請專利範圍第1項至第4項中任一項所述之紫外線照射裝置,其中上述紫外線燈成為長條圓筒形狀,上述箱體成為收納上述紫外線燈的長條筒形狀,並且具有沿著上述紫外線燈的長度方向的開口部。 The ultraviolet irradiation device according to any one of the preceding claims, wherein the ultraviolet lamp is in the shape of a long cylinder, and the casing is in the shape of a long cylinder accommodating the ultraviolet lamp, and has an edge The opening of the ultraviolet lamp in the longitudinal direction is formed. 如申請專利範圍第5項所述之紫外線照射裝置,其中上述氣體供給機構遍及上述箱體的大致整個長度方向將氣體供給至上述箱體內。 The ultraviolet irradiation device according to claim 5, wherein the gas supply mechanism supplies gas to the casing over substantially the entire length of the casing. 如申請專利範圍第1項至第5項中任一項所述之紫外線照射裝置,其中上述氣體供給機構包括:第1供給部,於上述箱體的上部,朝向與形成於上述箱體內的氣體循環方向相同的方向供給氣體;以及第2供給部,於上述箱體的開口部,朝向與藉由上述第1供給部所供給的氣體的循環方向相同的方向供給氣體。 The ultraviolet irradiation device according to any one of the preceding claims, wherein the gas supply mechanism includes: a first supply unit that faces the gas formed in the tank at an upper portion of the casing The gas is supplied in the same direction in the circulation direction; and the second supply unit supplies the gas in the same direction as the circulation direction of the gas supplied from the first supply unit in the opening of the casing. 如申請專利範圍第1項至第7項中任一項所述之紫外線照射裝置,其中藉由上述氣體供給機構所供給的氣體的循環方向是沿著上述工件的搬送方向的方向。 The ultraviolet irradiation device according to any one of claims 1 to 7, wherein a circulation direction of the gas supplied by the gas supply means is a direction along a conveying direction of the workpiece. 如申請專利範圍第1項至第8項中任一項所述之紫外線照射裝置,其中上述箱體的開口部是以未遮擋上述紫外線燈的紫外線照射範圍的方式所形成的,並且上述箱體的開口部具有覆蓋部,該覆蓋部自該開口部向上述工件側延伸設置,且以未遮擋上述紫外線燈的紫外線照射範圍的方式覆蓋上述工件。 The ultraviolet irradiation device according to any one of the first aspect, wherein the opening of the casing is formed so as not to block an ultraviolet irradiation range of the ultraviolet lamp, and the casing is The opening has a covering portion that extends from the opening toward the workpiece side and covers the workpiece so as not to block the ultraviolet irradiation range of the ultraviolet lamp. 如申請專利範圍第1項至第9項中任一項所述之紫外線照射裝置,其中上述氣體為惰性氣體或製程氣體。 The ultraviolet irradiation device according to any one of the preceding claims, wherein the gas is an inert gas or a process gas.
TW101122829A 2011-06-27 2012-06-26 Ultraviolet irradiation device TW201300177A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011142320 2011-06-27

Publications (1)

Publication Number Publication Date
TW201300177A true TW201300177A (en) 2013-01-01

Family

ID=47394897

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101122829A TW201300177A (en) 2011-06-27 2012-06-26 Ultraviolet irradiation device

Country Status (4)

Country Link
JP (1) JP2013033948A (en)
KR (1) KR20130007464A (en)
CN (1) CN102847691A (en)
TW (1) TW201300177A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825353B (en) * 2019-10-07 2023-12-11 日商牛尾電機股份有限公司 UV irradiation device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103436850B (en) * 2013-06-27 2015-09-16 苏州求是真空电子有限公司 A kind of ultraviolet supplementary unit of reaction magnetocontrol sputtering plated film
JP6586827B2 (en) * 2015-08-31 2019-10-09 ウシオ電機株式会社 UV treatment equipment
JP6600566B2 (en) * 2016-01-19 2019-10-30 東京応化工業株式会社 Ultraviolet irradiation apparatus and ultraviolet irradiation method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (en) * 2000-04-25 2001-10-30 Hoya Schott Kk Ultraviolet light irradiation device
US6676762B2 (en) * 2001-01-15 2004-01-13 Board Of Trustees Of Michigan State University Method for cleaning a finished and polished surface of a metal automotive wheel
JP4569636B2 (en) * 2008-01-22 2010-10-27 ウシオ電機株式会社 Excimer discharge lamp
JP5092808B2 (en) * 2008-03-06 2012-12-05 ウシオ電機株式会社 Ultraviolet irradiation unit and ultraviolet irradiation treatment device
JP2009268974A (en) * 2008-05-08 2009-11-19 Toppan Printing Co Ltd Ultraviolet irradiation method and ultraviolet irradiation apparatus
JP5083184B2 (en) * 2008-11-26 2012-11-28 ウシオ電機株式会社 Excimer lamp device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825353B (en) * 2019-10-07 2023-12-11 日商牛尾電機股份有限公司 UV irradiation device

Also Published As

Publication number Publication date
CN102847691A (en) 2013-01-02
JP2013033948A (en) 2013-02-14
KR20130007464A (en) 2013-01-18

Similar Documents

Publication Publication Date Title
KR102432205B1 (en) gas processing unit
CN105493235B (en) Light projection device
CN100521097C (en) ultraviolet washing device and washing method
TW201300177A (en) Ultraviolet irradiation device
JP2009268974A (en) Ultraviolet irradiation method and ultraviolet irradiation apparatus
JP2019018164A (en) Light irradiation device
JP2008279396A (en) UV irradiation equipment
JP4640421B2 (en) UV irradiation equipment
KR101553735B1 (en) Light irradiation apparatus
JP2004119942A (en) Ultraviolet irradiation device
CN108687057B (en) Light irradiation device
JP4883133B2 (en) UV light cleaning equipment
JP2018038956A (en) Liquid processing equipment
JP2015103545A (en) Light source device, and desmear treatment device
TW201024852A (en) Excimer lamp apparatus
JP2002239484A (en) Substrate processing equipment using dielectric barrier discharge lamp
JP5601551B2 (en) Light irradiation device
WO2014199808A1 (en) Ashing apparatus
JPS62274727A (en) processing equipment
JP3059223U (en) UV irradiation device
JP2014193450A (en) Light radiation device
WO2015076030A1 (en) Ashing device and object-to-be-treated holding structure
JP2021104498A (en) Gas supply device
JP2007149938A (en) Substrate processing apparatus, substrate processing method, and display apparatus
JP2016146385A (en) Optical processing apparatus and optical processing method