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TW200815915A - Photosensitive resin composition and bump for controlling liquid crystal alignment using the same - Google Patents

Photosensitive resin composition and bump for controlling liquid crystal alignment using the same Download PDF

Info

Publication number
TW200815915A
TW200815915A TW096121573A TW96121573A TW200815915A TW 200815915 A TW200815915 A TW 200815915A TW 096121573 A TW096121573 A TW 096121573A TW 96121573 A TW96121573 A TW 96121573A TW 200815915 A TW200815915 A TW 200815915A
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
liquid crystal
mass
bump
Prior art date
Application number
TW096121573A
Other languages
English (en)
Chinese (zh)
Inventor
Kiyoshi Uchikawa
Tetsuya Kato
Hiroyuki Ohnishi
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200815915A publication Critical patent/TW200815915A/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
TW096121573A 2006-06-22 2007-06-14 Photosensitive resin composition and bump for controlling liquid crystal alignment using the same TW200815915A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006172875A JP5042539B2 (ja) 2006-06-22 2006-06-22 感光性樹脂組成物、およびこれを用いた液晶配向制御用バンプ

Publications (1)

Publication Number Publication Date
TW200815915A true TW200815915A (en) 2008-04-01

Family

ID=38991650

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096121573A TW200815915A (en) 2006-06-22 2007-06-14 Photosensitive resin composition and bump for controlling liquid crystal alignment using the same

Country Status (4)

Country Link
JP (1) JP5042539B2 (ja)
KR (1) KR100878794B1 (ja)
CN (1) CN101093321A (ja)
TW (1) TW200815915A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008077073A (ja) * 2006-08-23 2008-04-03 Mitsubishi Chemicals Corp 液晶配向制御突起用感光性組成物、液晶配向制御突起、及び液晶表示装置
KR101486560B1 (ko) * 2010-12-10 2015-01-27 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
CN108027561B (zh) * 2015-09-30 2021-10-08 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07100764B2 (ja) * 1990-07-03 1995-11-01 宇部興産株式会社 黒色光硬化性ポリマー組成物及び黒色の光硬化膜の形成方法
JP3977513B2 (ja) * 1998-04-28 2007-09-19 東レ株式会社 分割配向用基板及びこれを用いた液晶表示装置
KR100612994B1 (ko) * 2000-05-12 2006-08-14 삼성전자주식회사 액정 표시 장치 및 그에 사용되는 기판
JP4171167B2 (ja) * 2000-08-31 2008-10-22 富士フイルム株式会社 光硬化性組成物及び液晶表示素子
JP2002244293A (ja) 2001-02-22 2002-08-30 Nof Corp アルカリ現像性レジスト用樹脂組成物、ドライフィルム及びそれらの硬化物よりなるレジスト
JP4660990B2 (ja) * 2001-07-17 2011-03-30 Jsr株式会社 感放射線性樹脂組成物、それから形成された突起材およびスペーサー、ならびにそれらを具備する液晶表示素子
JP2003295197A (ja) * 2002-04-05 2003-10-15 Toray Ind Inc 液晶分割配向用突起、カラーフィルター、電極基板、および、これを用いた液晶表示装置
KR100870020B1 (ko) * 2002-10-04 2008-11-21 삼성전자주식회사 용해 특성을 조절하는 감광성 수지 조성물 및 이를 이용한이층 구조의 패턴 형성 방법
JP4461683B2 (ja) * 2003-01-17 2010-05-12 セイコーエプソン株式会社 電気光学装置用基板、電気光学装置、電子機器、及び電気光学装置用基板の製造方法
WO2005008338A1 (ja) 2003-07-17 2005-01-27 Hitachi Chemical Co., Ltd. ネガ型感光性樹脂組成物及びネガ型感光性エレメント
KR20050101920A (ko) * 2004-04-20 2005-10-25 주식회사 엘지화학 액정 표시 장치용 블랙 매트릭스에 사용되는 감광성 수지조성물
KR101119818B1 (ko) * 2004-12-07 2012-03-06 주식회사 동진쎄미켐 컬러필터용 감광성 수지 조성물 및 이를 이용한액정디스플레이 컬러필터의 제조방법

Also Published As

Publication number Publication date
CN101093321A (zh) 2007-12-26
JP2008003320A (ja) 2008-01-10
KR100878794B1 (ko) 2009-01-14
KR20070121542A (ko) 2007-12-27
JP5042539B2 (ja) 2012-10-03

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