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TW200717817A - Liquid crystal display device and method for manufacturing the same - Google Patents

Liquid crystal display device and method for manufacturing the same

Info

Publication number
TW200717817A
TW200717817A TW095133148A TW95133148A TW200717817A TW 200717817 A TW200717817 A TW 200717817A TW 095133148 A TW095133148 A TW 095133148A TW 95133148 A TW95133148 A TW 95133148A TW 200717817 A TW200717817 A TW 200717817A
Authority
TW
Taiwan
Prior art keywords
thin film
scan lines
lines
auxiliary capacitor
layer
Prior art date
Application number
TW095133148A
Other languages
English (en)
Other versions
TWI315914B (en
Inventor
Takayuki Kato
Hiroki Sugiyama
Shinichiro Nomura
Takao Atarashiya
Satoshi Morita
Takashi Sato
Original Assignee
Sanyo Epson Imaging Devices Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Epson Imaging Devices Co filed Critical Sanyo Epson Imaging Devices Co
Publication of TW200717817A publication Critical patent/TW200717817A/zh
Application granted granted Critical
Publication of TWI315914B publication Critical patent/TWI315914B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136213Storage capacitors associated with the pixel electrode
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • G02F1/136295Materials; Compositions; Manufacture processes

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
TW095133148A 2005-09-13 2006-09-08 Liquid crystal display device and method for manufacturing the same TWI315914B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005264825 2005-09-13
JP2005315730 2005-10-31
JP2005315728 2005-10-31
JP2006184115A JP4301259B2 (ja) 2005-09-13 2006-07-04 液晶表示装置及びその製造方法

Publications (2)

Publication Number Publication Date
TW200717817A true TW200717817A (en) 2007-05-01
TWI315914B TWI315914B (en) 2009-10-11

Family

ID=37854677

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133148A TWI315914B (en) 2005-09-13 2006-09-08 Liquid crystal display device and method for manufacturing the same

Country Status (3)

Country Link
US (1) US7602452B2 (zh)
JP (1) JP4301259B2 (zh)
TW (1) TWI315914B (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101153528B1 (ko) * 2006-03-15 2012-06-11 샤프 가부시키가이샤 액티브 매트릭스 기판, 표시 장치 및 텔레비전 수상기
KR101282404B1 (ko) * 2006-09-05 2013-07-04 삼성디스플레이 주식회사 액정 표시 장치의 제조 방법
JP4285533B2 (ja) 2006-12-04 2009-06-24 エプソンイメージングデバイス株式会社 液晶表示装置及びその製造方法
KR101329779B1 (ko) * 2007-04-12 2013-11-15 삼성디스플레이 주식회사 표시 기판, 이의 제조 방법 및 이를 갖는 표시 장치
KR101389923B1 (ko) * 2008-04-21 2014-04-29 삼성디스플레이 주식회사 고개구율 어레이 기판, 액정 표시 장치 및 이들의 제조방법
JP5213596B2 (ja) * 2008-09-08 2013-06-19 株式会社ジャパンディスプレイウェスト 液晶表示装置
JP2012027046A (ja) * 2008-11-21 2012-02-09 Sharp Corp 液晶表示装置
EP2360518A4 (en) * 2008-12-09 2012-07-04 Sharp Kk ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL PANEL, LIQUID CRYSTAL DISPLAY UNIT, LIQUID CRYSTAL DISPLAY DEVICE AND TV RECEIVER
US20120069260A1 (en) * 2009-06-22 2012-03-22 Sharp Kabushiki Kaisha Active matrix substrate, liquid crystal display device including the same, and method for fabricating active matrix substrate
JP2011170172A (ja) * 2010-02-19 2011-09-01 Seiko Epson Corp 電気泳動表示装置及び電子機器
TWI449004B (zh) * 2010-08-30 2014-08-11 Au Optronics Corp 畫素結構及其製造方法
WO2012090879A1 (ja) * 2010-12-28 2012-07-05 シャープ株式会社 アクティブマトリクス基板
KR102679509B1 (ko) 2012-09-13 2024-07-01 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR102045808B1 (ko) * 2012-12-13 2019-11-18 엘지디스플레이 주식회사 터치센서 일체형 표시장치
KR20250054132A (ko) 2012-12-25 2025-04-22 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US10008513B2 (en) 2013-09-05 2018-06-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
CN103474436B (zh) * 2013-09-18 2016-03-09 京东方科技集团股份有限公司 一种阵列基板及其制作方法、显示装置
KR102210524B1 (ko) 2013-11-13 2021-02-03 삼성디스플레이 주식회사 표시패널
KR20160034200A (ko) * 2014-09-19 2016-03-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치의 제작 방법
DE102020004282A1 (de) * 2019-07-24 2021-01-28 AGC lnc. Elektrische verbindungsstruktur

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2584290B2 (ja) 1988-09-19 1997-02-26 三洋電機株式会社 液晶表示装置の製造方法
JP2874256B2 (ja) 1990-03-12 1999-03-24 富士通株式会社 薄膜トランジスタマトリクスの製造方法
JP2827570B2 (ja) 1991-05-14 1998-11-25 三菱電機株式会社 液晶ディスプレイ
JPH07191348A (ja) 1993-12-27 1995-07-28 Rohm Co Ltd 液晶表示装置の製法
JP3410296B2 (ja) 1996-08-02 2003-05-26 シャープ株式会社 液晶表示装置及びその製造方法
US6535535B1 (en) * 1999-02-12 2003-03-18 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and semiconductor device
JP3916823B2 (ja) * 1999-04-07 2007-05-23 シャープ株式会社 アクティブマトリクス基板およびその製造方法、並びにフラットパネル型イメージセンサ
JP3844913B2 (ja) 1999-06-28 2006-11-15 アルプス電気株式会社 アクティブマトリックス型液晶表示装置
JP4700156B2 (ja) 1999-09-27 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
JP3581073B2 (ja) * 2000-03-07 2004-10-27 シャープ株式会社 イメージセンサおよびその製造方法
JP4777500B2 (ja) * 2000-06-19 2011-09-21 三菱電機株式会社 アレイ基板およびそれを用いた表示装置ならびにアレイ基板の製造方法
JP2005506575A (ja) 2001-09-26 2005-03-03 サムスン エレクトロニクス カンパニー リミテッド 薄膜トランジスタ基板及びその製造方法と液晶表示装置
JP2003222854A (ja) 2002-01-31 2003-08-08 Casio Comput Co Ltd 液晶表示装置およびその製造方法
US7042149B2 (en) * 2002-06-13 2006-05-09 Tfpd Corporation Circuit array substrate for display device
JP2004219991A (ja) * 2002-12-27 2004-08-05 Sharp Corp 表示装置用基板およびこれを有する液晶表示装置
JP4356467B2 (ja) 2004-02-02 2009-11-04 ソニー株式会社 半導体装置の製造方法
JP4275644B2 (ja) * 2004-06-23 2009-06-10 シャープ株式会社 アクティブマトリクス基板およびその製造方法、並びに電子装置
US7282727B2 (en) * 2004-07-26 2007-10-16 Retsky Michael W Electron beam directed energy device and methods of using same
US7884900B2 (en) * 2005-05-26 2011-02-08 Toshiba Matsushita Display Technology Co., Ltd. Liquid crystal display device with partition walls made of color filter layers as a dam for the light shielding material
US8212953B2 (en) * 2005-12-26 2012-07-03 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same

Also Published As

Publication number Publication date
JP2007148345A (ja) 2007-06-14
TWI315914B (en) 2009-10-11
US7602452B2 (en) 2009-10-13
JP4301259B2 (ja) 2009-07-22
US20070058097A1 (en) 2007-03-15

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