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TW200603899A - Method and system for dispensing resist solution - Google Patents

Method and system for dispensing resist solution

Info

Publication number
TW200603899A
TW200603899A TW094119069A TW94119069A TW200603899A TW 200603899 A TW200603899 A TW 200603899A TW 094119069 A TW094119069 A TW 094119069A TW 94119069 A TW94119069 A TW 94119069A TW 200603899 A TW200603899 A TW 200603899A
Authority
TW
Taiwan
Prior art keywords
solution
substrate
dispensing
dispensed
resist solution
Prior art date
Application number
TW094119069A
Other languages
English (en)
Other versions
TWI302853B (en
Inventor
Tom Winter
Minoru Kubota
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200603899A publication Critical patent/TW200603899A/zh
Application granted granted Critical
Publication of TWI302853B publication Critical patent/TWI302853B/zh

Links

Classifications

    • H10P72/0448—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
TW094119069A 2004-07-01 2005-06-09 Method and system for dispensing resist solution TWI302853B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/880,556 US7670643B2 (en) 2004-07-01 2004-07-01 Method and system for dispensing resist solution

Publications (2)

Publication Number Publication Date
TW200603899A true TW200603899A (en) 2006-02-01
TWI302853B TWI302853B (en) 2008-11-11

Family

ID=35599756

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094119069A TWI302853B (en) 2004-07-01 2005-06-09 Method and system for dispensing resist solution

Country Status (3)

Country Link
US (2) US7670643B2 (zh)
TW (1) TWI302853B (zh)
WO (1) WO2006006982A2 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8372757B2 (en) * 2003-10-20 2013-02-12 Novellus Systems, Inc. Wet etching methods for copper removal and planarization in semiconductor processing
US20090241995A1 (en) * 2008-03-31 2009-10-01 Tokyo Electron Limited Substrate cleaning method and apparatus
US8236705B2 (en) 2010-07-26 2012-08-07 International Business Machines Corporation Deposition of viscous material
JP6027523B2 (ja) * 2013-12-05 2016-11-16 東京エレクトロン株式会社 基板処理装置及び基板処理方法並びに基板処理プログラムを記録した記録媒体
US9548199B2 (en) 2014-09-09 2017-01-17 Texas Instruments Incorporated Method of forming a thin film that eliminates air bubbles
JP6883462B2 (ja) * 2017-04-11 2021-06-09 東京エレクトロン株式会社 基板処理装置
WO2021076320A1 (en) 2019-10-15 2021-04-22 Tokyo Electron Limited Systems and methods for monitoring one or more characteristics of a substrate
US11637031B2 (en) 2019-11-04 2023-04-25 Tokyo Electron Limited Systems and methods for spin process video analysis during substrate processing
US11276157B2 (en) 2019-11-14 2022-03-15 Tokyo Electron Limited Systems and methods for automated video analysis detection techniques for substrate process
US11624607B2 (en) 2020-01-06 2023-04-11 Tokyo Electron Limited Hardware improvements and methods for the analysis of a spinning reflective substrates
JP7671558B2 (ja) 2020-03-10 2025-05-02 東京エレクトロン株式会社 トラックシステムに統合するための長波赤外線熱センサ
US11738363B2 (en) 2021-06-07 2023-08-29 Tokyo Electron Limited Bath systems and methods thereof
US12488452B2 (en) 2021-06-16 2025-12-02 Tokyo Electron Limited Wafer bath imaging
CN116967929A (zh) * 2023-07-13 2023-10-31 杭州众硅电子科技有限公司 一种晶圆抛光系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US642155A (en) * 1899-09-05 1900-01-30 George Redford Wrench.
US3198657A (en) 1964-09-17 1965-08-03 Ibm Process for spin coating objects
US5094884A (en) 1990-04-24 1992-03-10 Machine Technology, Inc. Method and apparatus for applying a layer of a fluid material on a semiconductor wafer
US5902399A (en) 1995-07-27 1999-05-11 Micron Technology, Inc. Method and apparatus for improved coating of a semiconductor wafer
US6642155B1 (en) 1998-06-05 2003-11-04 Micron Technology, Inc. Method for applying a fluid to a rotating silicon wafer surface
TW457550B (en) 1999-04-19 2001-10-01 Tokyo Electron Ltd Method for forming coating film and applicator

Also Published As

Publication number Publication date
TWI302853B (en) 2008-11-11
WO2006006982A2 (en) 2006-01-19
WO2006006982A3 (en) 2006-12-14
US7670643B2 (en) 2010-03-02
US20060013953A1 (en) 2006-01-19
US20090317546A1 (en) 2009-12-24

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees