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JPS5769324A - Monitor device of dc power supply - Google Patents

Monitor device of dc power supply

Info

Publication number
JPS5769324A
JPS5769324A JP14113280A JP14113280A JPS5769324A JP S5769324 A JPS5769324 A JP S5769324A JP 14113280 A JP14113280 A JP 14113280A JP 14113280 A JP14113280 A JP 14113280A JP S5769324 A JPS5769324 A JP S5769324A
Authority
JP
Japan
Prior art keywords
pulse
voltage
power supply
glow discharge
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14113280A
Other languages
Japanese (ja)
Inventor
Torajiro Matsumoto
Yoshio Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DAIWA DENGIYOU KK
Showa Shinku Co Ltd
Original Assignee
DAIWA DENGIYOU KK
Showa Shinku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DAIWA DENGIYOU KK, Showa Shinku Co Ltd filed Critical DAIWA DENGIYOU KK
Priority to JP14113280A priority Critical patent/JPS5769324A/en
Publication of JPS5769324A publication Critical patent/JPS5769324A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Control Of Voltage And Current In General (AREA)

Abstract

PURPOSE:To eliminate monitor performed by a maintainer and at the same time to give the close monitor to the stability of electric descharge, by counting the shifting frequency from the glow discharge to the arc discharge to obtain a detection output. CONSTITUTION:The pulse number setting mechanism of a pulse counter 7 is set to the proper number of pulses that decides no recovery to the normal glow discharge. When the glow discharge of load becomes unstable, the output DC voltage corresponding to the arc discharge stage is devided by a potentiometer 3 to be applied to an input terminal of a comparator 4. This divided voltage is then compared with the voltage of a setting power supply 5. As the voltage of the supply 5 is set at the divided voltage at that moment, the signal is delivered from the comparator 4 at this moment. Then the pulse is generated from a pulse generating circuit 6. The counter 7 counts these pulses and delivers a ddtection signal when the count value reaches the set pulse numerical value. This detection signal actuates an alarm curcuit 8 and a breaker 9. Thus a power supply circuit is cut off, and at the same time an alarm is produced.
JP14113280A 1980-10-11 1980-10-11 Monitor device of dc power supply Pending JPS5769324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14113280A JPS5769324A (en) 1980-10-11 1980-10-11 Monitor device of dc power supply

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14113280A JPS5769324A (en) 1980-10-11 1980-10-11 Monitor device of dc power supply

Publications (1)

Publication Number Publication Date
JPS5769324A true JPS5769324A (en) 1982-04-28

Family

ID=15284904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14113280A Pending JPS5769324A (en) 1980-10-11 1980-10-11 Monitor device of dc power supply

Country Status (1)

Country Link
JP (1) JPS5769324A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993012632A1 (en) * 1991-12-10 1993-06-24 Satiko Okazaki Method of monitoring atmospheric pressure glow discharge plasma
US5427669A (en) * 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
US5576939A (en) * 1995-05-05 1996-11-19 Drummond; Geoffrey N. Enhanced thin film DC plasma power supply
US5584974A (en) * 1995-10-20 1996-12-17 Eni Arc control and switching element protection for pulsed dc cathode sputtering power supply
US5611899A (en) * 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
US5645698A (en) * 1992-09-30 1997-07-08 Advanced Energy Industries, Inc. Topographically precise thin film coating system
US5682067A (en) * 1996-06-21 1997-10-28 Sierra Applied Sciences, Inc. Circuit for reversing polarity on electrodes
US5718813A (en) * 1992-12-30 1998-02-17 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US5882492A (en) * 1996-06-21 1999-03-16 Sierra Applied Sciences, Inc. A.C. plasma processing system
US5889391A (en) * 1997-11-07 1999-03-30 Sierra Applied Sciences, Inc. Power supply having combined regulator and pulsing circuits
US5910886A (en) * 1997-11-07 1999-06-08 Sierra Applied Sciences, Inc. Phase-shift power supply
US5990668A (en) * 1997-11-07 1999-11-23 Sierra Applied Sciences, Inc. A.C. power supply having combined regulator and pulsing circuits
US5993613A (en) * 1997-11-07 1999-11-30 Sierra Applied Sciences, Inc. Method and apparatus for periodic polarity reversal during an active state
US6007879A (en) * 1995-04-07 1999-12-28 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
US6011704A (en) * 1997-11-07 2000-01-04 Sierra Applied Sciences, Inc. Auto-ranging power supply
US6217717B1 (en) 1992-12-30 2001-04-17 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285798A (en) * 1976-01-09 1977-07-16 Tokuda Seisakusho Spattering power source device
JPS53135250A (en) * 1977-04-30 1978-11-25 Toshiba Corp Protecting method for decrease of gate power supply voltage of high-voltage thyristor converter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285798A (en) * 1976-01-09 1977-07-16 Tokuda Seisakusho Spattering power source device
JPS53135250A (en) * 1977-04-30 1978-11-25 Toshiba Corp Protecting method for decrease of gate power supply voltage of high-voltage thyristor converter

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539303A (en) * 1991-12-10 1996-07-23 Okazako; Satiko Method for monitoring atmospheric pressure glow discharge plasma using current pulse-count and/or Lissajous figure
WO1993012632A1 (en) * 1991-12-10 1993-06-24 Satiko Okazaki Method of monitoring atmospheric pressure glow discharge plasma
US5645698A (en) * 1992-09-30 1997-07-08 Advanced Energy Industries, Inc. Topographically precise thin film coating system
US6120656A (en) * 1992-09-30 2000-09-19 Advanced Energy Industries, Inc. Topographically precise thin film coating system
US5427669A (en) * 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
US6521099B1 (en) 1992-12-30 2003-02-18 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system
US6217717B1 (en) 1992-12-30 2001-04-17 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system
US5718813A (en) * 1992-12-30 1998-02-17 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US6001224A (en) * 1993-04-02 1999-12-14 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US5611899A (en) * 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
US6007879A (en) * 1995-04-07 1999-12-28 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
US5576939A (en) * 1995-05-05 1996-11-19 Drummond; Geoffrey N. Enhanced thin film DC plasma power supply
US5584974A (en) * 1995-10-20 1996-12-17 Eni Arc control and switching element protection for pulsed dc cathode sputtering power supply
US5882492A (en) * 1996-06-21 1999-03-16 Sierra Applied Sciences, Inc. A.C. plasma processing system
US5815388A (en) * 1996-06-21 1998-09-29 Sierra Applied Sciences, Inc. Polarity reversing circuit having energy compensation
US5682067A (en) * 1996-06-21 1997-10-28 Sierra Applied Sciences, Inc. Circuit for reversing polarity on electrodes
US5889391A (en) * 1997-11-07 1999-03-30 Sierra Applied Sciences, Inc. Power supply having combined regulator and pulsing circuits
US5910886A (en) * 1997-11-07 1999-06-08 Sierra Applied Sciences, Inc. Phase-shift power supply
US5990668A (en) * 1997-11-07 1999-11-23 Sierra Applied Sciences, Inc. A.C. power supply having combined regulator and pulsing circuits
US5993613A (en) * 1997-11-07 1999-11-30 Sierra Applied Sciences, Inc. Method and apparatus for periodic polarity reversal during an active state
US6011704A (en) * 1997-11-07 2000-01-04 Sierra Applied Sciences, Inc. Auto-ranging power supply

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