JPH069460A - Production of di-(protected 2,3-hydroxymethyl)cyclobutanol - Google Patents
Production of di-(protected 2,3-hydroxymethyl)cyclobutanolInfo
- Publication number
- JPH069460A JPH069460A JP5122495A JP12249593A JPH069460A JP H069460 A JPH069460 A JP H069460A JP 5122495 A JP5122495 A JP 5122495A JP 12249593 A JP12249593 A JP 12249593A JP H069460 A JPH069460 A JP H069460A
- Authority
- JP
- Japan
- Prior art keywords
- group
- prot
- reducing agent
- solvent
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- RUYNTLUDGSFPFZ-UHFFFAOYSA-N cyclobutanol Chemical compound OC1[CH]CC1 RUYNTLUDGSFPFZ-UHFFFAOYSA-N 0.000 title 1
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 25
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 14
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 11
- 239000001257 hydrogen Substances 0.000 claims abstract description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 238000002360 preparation method Methods 0.000 claims abstract description 10
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 229910021639 Iridium tetrachloride Inorganic materials 0.000 claims abstract description 7
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 7
- CALMYRPSSNRCFD-UHFFFAOYSA-J tetrachloroiridium Chemical compound Cl[Ir](Cl)(Cl)Cl CALMYRPSSNRCFD-UHFFFAOYSA-J 0.000 claims abstract description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 6
- 125000005234 alkyl aluminium group Chemical group 0.000 claims abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000003054 catalyst Substances 0.000 claims abstract description 6
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 claims abstract description 6
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 claims abstract description 6
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims abstract 8
- -1 t-butyldiphenylsilyl Chemical group 0.000 claims description 49
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 31
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 30
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 27
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 23
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 13
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 10
- 238000009835 boiling Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 8
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 claims description 8
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 5
- NMVXHZSPDTXJSJ-UHFFFAOYSA-L 2-methylpropylaluminum(2+);dichloride Chemical group CC(C)C[Al](Cl)Cl NMVXHZSPDTXJSJ-UHFFFAOYSA-L 0.000 claims description 4
- HQMRIBYCTLBDAK-UHFFFAOYSA-M bis(2-methylpropyl)alumanylium;chloride Chemical compound CC(C)C[Al](Cl)CC(C)C HQMRIBYCTLBDAK-UHFFFAOYSA-M 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical group CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 claims description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 2
- 230000017105 transposition Effects 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 abstract description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 8
- SHQSVMDWKBRBGB-UHFFFAOYSA-N cyclobutanone Chemical compound O=C1CCC1 SHQSVMDWKBRBGB-UHFFFAOYSA-N 0.000 abstract description 2
- 239000004599 antimicrobial Substances 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 27
- 150000002148 esters Chemical class 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 125000006239 protecting group Chemical group 0.000 description 8
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000007810 chemical reaction solvent Substances 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 239000003242 anti bacterial agent Substances 0.000 description 4
- 239000012267 brine Substances 0.000 description 4
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- GAADRFVRUBFCML-UHFFFAOYSA-N [2-(hydroxymethyl)cyclobutyl]methanol Chemical compound OCC1CCC1CO GAADRFVRUBFCML-UHFFFAOYSA-N 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- DHLOVVSQPVFYKE-UHFFFAOYSA-N (2-oxocyclobutyl)methyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1CCC1=O DHLOVVSQPVFYKE-UHFFFAOYSA-N 0.000 description 2
- LYOILSKVIWMXOM-RTBURBONSA-N (2s,3s)-2,3-bis(phenylmethoxymethyl)cyclobutan-1-one Chemical compound C([C@H]1CC([C@@H]1COCC=1C=CC=CC=1)=O)OCC1=CC=CC=C1 LYOILSKVIWMXOM-RTBURBONSA-N 0.000 description 2
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- KTVGYAJQQQUOQX-UHFFFAOYSA-N 1-(hydroxymethyl)cyclobutan-1-ol Chemical compound OCC1(O)CCC1 KTVGYAJQQQUOQX-UHFFFAOYSA-N 0.000 description 1
- ZHZONFNMAUYUJB-UHFFFAOYSA-N 2-(phenylmethoxymethyl)cyclobutan-1-one Chemical compound O=C1CCC1COCC1=CC=CC=C1 ZHZONFNMAUYUJB-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- WWHZKHHZRIJLEM-UHFFFAOYSA-N 2-phenylmethoxyguanidine Chemical compound NC(N)=NOCC1=CC=CC=C1 WWHZKHHZRIJLEM-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- RYWNYUWMBMTYBG-IRXDYDNUSA-N [(1r,2r)-2-(benzoyloxymethyl)-3-oxocyclobutyl]methyl benzoate Chemical compound C([C@@H]1C(=O)C[C@H]1COC(=O)C=1C=CC=CC=1)OC(=O)C1=CC=CC=C1 RYWNYUWMBMTYBG-IRXDYDNUSA-N 0.000 description 1
- RYWNYUWMBMTYBG-IAGOWNOFSA-N [(1s,2s)-2-(benzoyloxymethyl)-3-oxocyclobutyl]methyl benzoate Chemical compound C([C@H]1C(=O)C[C@@H]1COC(=O)C=1C=CC=CC=1)OC(=O)C1=CC=CC=C1 RYWNYUWMBMTYBG-IAGOWNOFSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- ISFMCQATCMRFPY-UHFFFAOYSA-M chloro(diphenyl)alumane Chemical compound [Cl-].C=1C=CC=CC=1[Al+]C1=CC=CC=C1 ISFMCQATCMRFPY-UHFFFAOYSA-M 0.000 description 1
- CQFXNLZDAXORGD-UHFFFAOYSA-M chloro-(triphenyl-$l^{5}-phosphanylidene)rhodium Chemical compound [Rh]Cl.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 CQFXNLZDAXORGD-UHFFFAOYSA-M 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- UYLWKSJTHLRFBX-UHFFFAOYSA-N purin-6-one Chemical compound O=C1N=CN=C2N=CN=C12 UYLWKSJTHLRFBX-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/28—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group
- C07C67/29—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by introduction of oxygen-containing functional groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はジ保護2,3−ヒドロキ
シメチルシクロブタノールの製造法、更に詳しくは、特
定の保護されたシクロブタノンと還元剤を反応させるこ
とから成る、抗菌剤の製造中間体として有用なシクロブ
タノール化合物の改良製造法に関する。FIELD OF THE INVENTION The present invention relates to a method for producing diprotected 2,3-hydroxymethylcyclobutanol, and more particularly, an intermediate for producing an antibacterial agent, which comprises reacting a specific protected cyclobutanone with a reducing agent. The present invention relates to an improved process for producing a cyclobutanol compound useful as
【0002】[0002]
【発明の構成】本発明に係る製造法は、式:The manufacturing method according to the present invention has the formula:
【化5】 (式中、Protは保護基である)で示されるジ保護2,3
−ヒドロキシメチルシクロブタノール(I)の製造法で
あって、式:[Chemical 5] (Wherein Prot is a protecting group) di-protected 2,3
A process for the preparation of hydroxymethylcyclobutanol (I), which has the formula:
【化6】 のシクロブタノン化合物(II)を、ジアルキルアルミ
ニウムクロリド、アルキルアルミニウムジクロリド、ト
リアルキルアルミニウム化合物、ルテニウムブラックま
たはルテニウム/アルミナ触媒の存在下の水素、トリス
(トリフェニルホスフィン)ロジウム(I)クロリドの
存在下のジフェニルシラン、および亜リン酸の存在下の
イリジウムテトラクロリドの群から選ばれる還元剤で処
理することにより、望ましくない式:[Chemical 6] Of cyclobutanone compound (II) of diphenylaluminum chloride, alkylaluminum dichloride, trialkylaluminum compound, hydrogen in the presence of ruthenium black or ruthenium / alumina catalyst, diphenyl in the presence of tris (triphenylphosphine) rhodium (I) chloride. By treatment with a reducing agent selected from the group of iridium tetrachloride in the presence of silane and phosphorous acid, the undesired formula:
【化7】 の異性体化合物に優先して、所望の式(I)のシクロブ
タノール化合物を得ることを特徴とする。[Chemical 7] To obtain the desired cyclobutanol compound of formula (I) in preference to the isomeric compound of
【0003】本発明の製造法において、シクロブタノン
化合物(II)をその光学活性(2S−トランス)体
(以下、[2S,3S]で称すこともある)で使用しう
る。この場合、所望のシクロブタノール化合物(I)
も、光学活性、すなわち、[1S−(1α,2β,3
β)]となる。この光学活性なシクロブタノール化合物
(I)は、光学活性抗菌剤、たとえば[1R−(1α,
2β,3α)]−2−アミノ−9−[2,3−ビス(ヒ
ドロキシメチル)シクロブチル]−1,9−ジヒドロ−
6H−プリン−6−オンに変換することができる。In the production method of the present invention, the cyclobutanone compound (II) can be used in its optically active (2S-trans) form (hereinafter also referred to as [2S, 3S]). In this case, the desired cyclobutanol compound (I)
Is also optically active, that is, [1S- (1α, 2β, 3
β)]. This optically active cyclobutanol compound (I) is an optically active antibacterial agent such as [1R- (1α,
2β, 3α)]-2-Amino-9- [2,3-bis (hydroxymethyl) cyclobutyl] -1,9-dihydro-
It can be converted to 6H-purin-6-one.
【0004】また本発明の製造法において、シクロブタ
ノン化合物(II)をラセミ化合物で使用することもで
き、この場合、所望のシクロブタノール化合物(I)は
光学活性、すなわち、(1α,2β,3β)となる。こ
のラセミ体のシクロブタノール化合物(I)は、ラセミ
体の抗菌剤、たとえば(±)−(1α,2β,3α)−
2−アミノ−9−[2,3−ビス(ヒドロキシメチル)
シクロブチル]−1,9−ジヒドロ−6H−プリン−6
−オンに変換することができる。In the production method of the present invention, the cyclobutanone compound (II) can be used as a racemic compound, in which case the desired cyclobutanol compound (I) is optically active, that is, (1α, 2β, 3β). Becomes This racemic cyclobutanol compound (I) is a racemic antibacterial agent such as (±)-(1α, 2β, 3α)-
2-amino-9- [2,3-bis (hydroxymethyl)
Cyclobutyl] -1,9-dihydro-6H-purine-6
-Can be turned on.
【0005】式(I)のジ保護2,3−ヒドロキシメチ
ルシクロブタノールにおいて、シクロブチル環上の置換
基の相対的立体化学によれば、ヒドロキシ置換基は隣位
の−CH2−O−Prot置換基に対しシスの位置にあり、
また2つの−CH2−O−Prot置換基は互いにトランス
の位置にあるということが示される。According to the relative stereochemistry of the substituents on the cyclobutyl ring in the diprotected 2,3-hydroxymethylcyclobutanol of formula (I), the hydroxy substituents are replaced by adjacent --CH 2 --O--Prot substitutions. In the cis position relative to the base,
The two -CH 2 -O-Prot substituents are shown that in the trans position to one another.
【0006】上記シクロブタノン化合物(II)を、ジ
アルキルアルミニウムクロリド(たとえばジイソブチル
アルミニウムクロリド)、アルキルアルミニウムジクロ
リド(たとえばイソブチルアルミニウムジクロリド)、
トリアルキルアルミニウム化合物(たとえばトリイソブ
チルアルミニウム)、ルテニウムブラックまたはルテニ
ウム/アルミナ触媒の存在下の水素、トリス(トリフェ
ニルホスフィン)ロジウム(I)クロリドの存在下のジ
フェニルシラン、および亜リン酸の存在下のイリジウム
テトラクロリドの群から選ばれる還元剤で処理すること
により、望ましくない異性体化合物(III)に優先し
て、所望の目的とする式(I)のジ保護2,3−ヒドロ
キシメチルシクロブタノールが得られる。The above cyclobutanone compound (II) is converted into a dialkylaluminum chloride (for example, diisobutylaluminum chloride), an alkylaluminum dichloride (for example, isobutylaluminum dichloride),
A trialkylaluminum compound (eg triisobutylaluminum), hydrogen in the presence of ruthenium black or a ruthenium / alumina catalyst, diphenylsilane in the presence of tris (triphenylphosphine) rhodium (I) chloride, and phosphorous acid. By treatment with a reducing agent selected from the group of iridium tetrachloride, the desired di-protected 2,3-hydroxymethylcyclobutanol of formula (I) is obtained in preference to the undesired isomeric compound (III). can get.
【0007】なお、「アルキル」とは、炭素数1〜2
0、好ましくは3〜10の直鎖または分枝鎖基を指称す
る。"Alkyl" has 1 to 2 carbon atoms.
0, preferably 3 to 10 straight or branched chain groups are designated.
【0008】Protはヒドロキシ保護基である。適当な
保護基としては、ヒンダードシリル基、たとえばt−ブ
チルジメチルシリル、t−ブチルジフェニルシリル、
(トリフェニルメチル)ジメチルシリル、メチルジイソ
プロピルシリルおよびトリイソプロピルシリルが挙げら
れる。また適当な保護基として、ベンジルおよび置換ベ
ンジル基、たとえばp−メトキシベンジルおよび式:Prot is a hydroxy protecting group. Suitable protecting groups include hindered silyl groups such as t-butyldimethylsilyl, t-butyldiphenylsilyl,
(Triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl. Also suitable as protecting groups are benzyl and substituted benzyl groups such as p-methoxybenzyl and the formula:
【化8】 (式中、R1は炭素数1〜6の直鎖または分枝鎖低級ア
ルキルまたはフェニルである)のアシル基も挙げられ、
好ましいアシル保護基はR1がフェニルのベンゾイルで
ある。[Chemical 8] (Wherein R 1 is a linear or branched lower alkyl having 1 to 6 carbon atoms or phenyl), and an acyl group can also be mentioned.
A preferred acyl protecting group is benzoyl where R 1 is phenyl.
【0009】本発明の製造法で用いる還元剤がジアルキ
ルアルミニウムクロリドであるとき、適当な反応溶媒と
しては、塩化メチレン、トルエンなどの反応しない中性
溶媒が挙げられる。反応は、約−90℃〜溶媒沸点、好
ましくは約−90〜0℃、最も好ましくは約−40℃の
温度で行うことができる。When the reducing agent used in the production method of the present invention is dialkylaluminum chloride, suitable reaction solvents include non-reactive neutral solvents such as methylene chloride and toluene. The reaction can be carried out at a temperature of about -90 ° C to solvent boiling point, preferably about -90 to 0 ° C, most preferably about -40 ° C.
【0010】本発明の製造法で用いる還元剤がアルキル
アルミニウムジクロリド(たとえばイソブチルアルミニ
ウムジクロリド)またはトリアルキルアルミニウム化合
物(たとえばトリイソブチルアルミニウム)であると
き、適当な反応溶媒としては、塩化メチレン、トルエン
などの反応しない中性溶媒が挙げられる。反応は、約−
90℃〜溶媒沸点、好ましくは約−90〜0℃の温度で
行うことができる。使用する還元剤がトリアルキルアル
ミニウム化合物のときは、保護基Protはベンゾイルで
あってはならない。When the reducing agent used in the production method of the present invention is an alkylaluminum dichloride (eg, isobutylaluminum dichloride) or a trialkylaluminum compound (eg, triisobutylaluminum), suitable reaction solvents include methylene chloride and toluene. A neutral solvent that does not react can be used. The reaction is about −
It can be carried out at a temperature of 90 ° C to the boiling point of the solvent, preferably about -90 to 0 ° C. If the reducing agent used is a trialkylaluminium compound, the protecting group Prot must not be benzoyl.
【0011】本発明の製造法で用いる還元剤が亜リン酸
の存在下のイリジウムテトラクロリドであるとき、適当
な反応溶媒としては、水、メタノール、プロパノール、
イソプロパノール等またはこれらの混合物(たとえば水
/イソプロパノール)などのヒドロキシル溶媒が挙げら
れる。反応は、約50〜100℃、最も好ましくは約8
0℃の温度で行うことができる。When the reducing agent used in the production method of the present invention is iridium tetrachloride in the presence of phosphorous acid, suitable reaction solvents include water, methanol, propanol,
Mention may be made of hydroxylic solvents such as isopropanol or the like or mixtures thereof (eg water / isopropanol). The reaction is about 50-100 ° C, most preferably about 8
It can be carried out at a temperature of 0 ° C.
【0012】本発明の製造法で用いる還元剤がルテニウ
ムブラック触媒の存在下の水素であるとき、適当な反応
溶媒としては、メタノール、イソプロパノールまたはこ
れらの混合物などのヒドロキシル溶媒(好ましくはメタ
ノール)が挙げられる。When the reducing agent used in the process of the present invention is hydrogen in the presence of a ruthenium black catalyst, suitable reaction solvents include hydroxyl solvents (preferably methanol) such as methanol, isopropanol or mixtures thereof. To be
【0013】本発明の製造法で用いる還元剤がルテニウ
ム/アルミナ触媒の存在下の水素であるとき、適当な反
応溶媒としては、ヒドロキシル溶媒、たとえばメタノー
ル(これが好ましい)、エタノール等が挙げられる(但
し、イソプロパノールを除く)。反応は、約−90℃〜
溶媒沸点、好ましくは0〜50℃、最も好ましくは約2
5℃の温度で行うことができる。When the reducing agent used in the process of the present invention is hydrogen in the presence of a ruthenium / alumina catalyst, suitable reaction solvents include hydroxyl solvents such as methanol (which is preferred), ethanol, etc. , Except for isopropanol). The reaction is about -90 ° C
Solvent boiling point, preferably 0-50 ° C, most preferably about 2
It can be carried out at a temperature of 5 ° C.
【0014】本発明の製造法で用いる還元剤がトリス
(トリフェニルホスフィン)ロジウム(I)クロリドの
存在下のジフェニルシランであるとき、適当な反応溶媒
としては、ベンゼン、トルエン、ヘキサン、シクロヘキ
サン等(好ましくはトルエン)が挙げられ、あるいは別
法として、溶媒の非存在下で反応を行うこともできる。
反応を溶媒存在下で行う場合、約0℃〜溶媒沸点、好ま
しくは約25℃の温度で反応を行う。反応を溶媒なしで
行う場合、約0〜120℃の温度で反応を行う。When the reducing agent used in the production method of the present invention is diphenylsilane in the presence of tris (triphenylphosphine) rhodium (I) chloride, suitable reaction solvents include benzene, toluene, hexane, cyclohexane and the like ( Preferred is toluene), or alternatively, the reaction can be carried out in the absence of a solvent.
When the reaction is carried out in the presence of a solvent, the reaction is carried out at a temperature of about 0 ° C to the boiling point of the solvent, preferably about 25 ° C. When the reaction is carried out without a solvent, the reaction is carried out at a temperature of about 0 to 120 ° C.
【0015】本発明の好ましい製造法において、還元剤
はジアルキルアルミニウムクロリド、最も好ましくはジ
イソブチルアルミニウムクロリド、保護基Protはベン
ゾイル、および出発物質のシクロブタノン化合物(I
I)は光学活性な(2S−トランス)体である。In the preferred process of the present invention, the reducing agent is a dialkylaluminum chloride, most preferably diisobutylaluminum chloride, the protecting group Prot is benzoyl, and the starting cyclobutanone compound (I
I) is an optically active (2S-trans) form.
【0016】式(II)の光学活性(2S−トランス)
ジ保護2,3−ヒドロキシメチルシクロブタノンは、ビ
サッチらのU.S.特許No.5064961、ノルベッ
クらのヨーロッパ特許出願No.366059、イチカ
ワらのヨーロッパ特許出願No.358154、パリザ
らのヨーロッパ特許出願No.452729、またはア
マッドのヨーロッパ特許出願No.458643の記載
に従って製造することができる。式(II)のラセミ体
の(トランス)−ジ保護2,3−ヒドロキシメチルシク
ロブタノンは、スラシャーシク(Slusarchyk)らのヨ
ーロッパ特許出願No.335355並びに上述のノル
ベックらおよびイチカワらのヨーロッパ特許出願の記載
に従って製造することができる。光学活性シクロブタノ
ン化合物(II)の他の製造法は、ゴッドフレイらの
U.S.特許No.5185463に記載されている。Optical activity of formula (II) (2S-trans)
Di-protected 2,3-hydroxymethylcyclobutanone is commercially available from Bisatch et al., US Patent No. 5064961, Norbeck et al., European Patent Application No. 366059, Ichikawa et al., European Patent Application No. 358154, and Pariza et al. .452729, or Amadd European Patent Application No. 4588634. The racemic (trans) -diprotected 2,3-hydroxymethylcyclobutanone of formula (II) is prepared according to the European patent application No. 335355 of Slusarchyk et al. And the European patent application of Norbeck et al. And Ichikawa et al. It can be manufactured. Another method for producing the optically active cyclobutanone compound (II) is described in God Frey et al., US Pat. No. 5,185,463.
【0017】ビサッチらのU.S.特許No.50649
61に開示の如く、式(I)の光学活性[1S−(1
α,2β,3β)]ジ保護2,3−ヒドロキシメチルシ
クロブタノールを塩化トシルで処理することにより、
式:US Pat. No. 50649 of Bisatch et al.
61, the optically active [1S- (1
α, 2β, 3β)] diprotected 2,3-hydroxymethylcyclobutanol by treatment with tosyl chloride,
formula:
【化9】 のシクロブタン化合物(IV)を得ることができる。[Chemical 9] The cyclobutane compound (IV) can be obtained.
【0018】次いでシクロブタン化合物(IV)を、
式:Then the cyclobutane compound (IV)
formula:
【化10】 のベンジルオキシグアニジン(V)で処理して、式:[Chemical 10] Treated with benzyloxyguanidine (V) of formula:
【化11】 の化合物(VI)を得る。[Chemical 11] Compound (VI) of
【0019】化合物(VI)の保護基を脱離することに
より、抗菌剤である[1R−(1α,2β,3α)]−
2−アミノ−9−[2,3−ビス(ヒドロキシメチル)
シクロブチル]−1,9−ジヒドロ−6H−プリン−6
−オンを得る。By removing the protecting group of compound (VI), an antibacterial agent [1R- (1α, 2β, 3α)]-
2-amino-9- [2,3-bis (hydroxymethyl)
Cyclobutyl] -1,9-dihydro-6H-purine-6
-Get on.
【0020】[0020]
【実施例】次に挙げる実施例は、本発明製造法の具体例
である。 実施例1 [1S−(1α,2β,3β)]−3−ヒドロキシ−
1,2−シクロブタンジメタノール・ジベンゾエートエ
ステルの製造:−機械式撹拌機、内部デジタル式温度
計、滴下漏斗、および窒素入口を備えた3lの三ツ首フ
ラスコに、2385mlの無水塩化メチレンを充填す
る。−40℃に冷却後、ジイソブチルアルミニウムクロ
リド(156.6g、886ミリモル、1.27モル当
量)を加える。この冷溶液に、塩化メチレン(600m
l)中の(2S−トランス)−2,3−ビス[(ベンゾ
イルオキシ)メチル]シクロブタノン(235g、69
9ミリモル)の溶液を滴下漏斗で、63分にわたって滴
下する。反応液を−40℃でさらに70分間維持する。
メタノール(502ml)をゆっくり加えて、反応を抑
える。反応を抑えている間、温度は1時間にわたって、
約−40℃から−32℃まで上昇する。冷却浴を取除
き、飽和塩化アンモニウム水溶液(502ml)を加え
る。18時間撹拌後、混合物を無水硫酸マグネシウム
(502g)で濾過し、濾過ケーキを塩化メチレンで完
全に洗う。濾液を減圧濃縮し、残渣をポンプ吸引下35
℃で乾燥して、287.3gの粗生成物を得る。少し湿
った固体を約2lのメタノールおよび約400mlの水
より結晶化して、160.6g(収率68%)の[1S
−(1α,2β,3β)]−3−ヒドロキシ−1,2−
シクロブタンジメタノール・ジベンゾエートエステルを
得る。m.p.75〜77℃、TLC(シリカゲル、40
%酢酸エチル/ヘキサン),Rf=0.39、[α]D=
−15.3°(C=1.1、クロロホルム)、HPLC:
HI(215nm、ゾラバックス(Zorabax)−シアノ
カラム、水/アセトニトリル勾配)99.5%。元素分析 (C20H20O5として) 計算値:C 70.38、H 5.94、H2O 0.27 実測値:C 69.92、H 5.87、H2O 0.27EXAMPLES The following examples are specific examples of the production method of the present invention. Example 1 [1S- (1α, 2β, 3β)]-3-hydroxy-
Preparation of 1,2-cyclobutane dimethanol dibenzoate ester: -Charge 2385 ml anhydrous methylene chloride into a 3 liter 3-necked flask equipped with mechanical stirrer, internal digital thermometer, dropping funnel and nitrogen inlet. To do. After cooling to -40 ° C, diisobutylaluminum chloride (156.6 g, 886 mmol, 1.27 molar equivalents) is added. Add methylene chloride (600 m) to this cold solution.
(2S-trans) -2,3-bis [(benzoyloxy) methyl] cyclobutanone in l) (235 g, 69
9 mmol) solution is added dropwise with a dropping funnel over 63 minutes. The reaction is maintained at -40 ° C for an additional 70 minutes.
Quench the reaction by slowly adding methanol (502 ml). While suppressing the reaction, the temperature is over 1 hour,
The temperature rises from about -40 ° C to -32 ° C. Remove the cooling bath and add saturated aqueous ammonium chloride solution (502 ml). After stirring for 18 hours, the mixture is filtered over anhydrous magnesium sulfate (502 g) and the filter cake is washed thoroughly with methylene chloride. The filtrate is concentrated under reduced pressure and the residue is pumped under suction 35
Dry at ℃ to obtain 287.3g of crude product. The slightly damp solid was crystallized from about 2 liters of methanol and about 400 ml of water to give 160.6 g (68% yield) of [1S
-(1α, 2β, 3β)]-3-Hydroxy-1,2-
Cyclobutane dimethanol dibenzoate ester is obtained. mp 75-77 ° C, TLC (silica gel, 40
% Ethyl acetate / hexane), Rf = 0.39, [α] D =
-15.3 ° (C = 1.1, chloroform), HPLC:
HI (215 nm, Zorabax-cyano column, water / acetonitrile gradient) 99.5%. Elemental analysis (C 20 H 20 O 5) Calculated value: C 70.38, H 5.94, H 2 O 0.27 Found: C 69.92, H 5.87, H 2 O 0.27
【0021】実施例2 [1S−(1α,2β,3β)]−3−ヒドロキシ−
1,2−シクロブタンジメタノール・ジベンジルエーテ
ルの製造:−イソブチルアルミニウムクロリドの0.7
1Mヘキサン溶液(3.41ml、2.42ミリモル)に
−78℃にて、トルエン(1ml)中の(2S−トラン
ス)−2,3−ビス[(ベンジルオキシ)メチル]シク
ロブタノン(0.5g、1.61ミリモル)を滴下する。
混合物を2時間にわたって室温まで徐々に加温せしめ
る。室温で30分間撹拌後、混合物を0℃で一夜静置す
る。酢酸エチルで希釈後、反応混合物に10%塩酸を加
えて、反応を抑える。有機相を塩水で洗い、乾燥(硫酸
マグネシウム)し、溶媒蒸発して、[1S−(1α,2
β,3β)]−3−ヒドロキシ−1,2−シクロブタン
ジメタノール・ジベンジルエーテルを得る。TLC(5
0%酢酸エチル/ヘキサン),Rf=0.53。Example 2 [1S- (1α, 2β, 3β)]-3-Hydroxy-
Preparation of 1,2-cyclobutanedimethanol dibenzyl ether: 0.7 of isobutylaluminum chloride
To a 1M hexane solution (3.41 ml, 2.42 mmol) at -78 ° C (2S-trans) -2,3-bis [(benzyloxy) methyl] cyclobutanone (0.5 g, in toluene (1 ml). 1.61 mmol) is added dropwise.
The mixture is allowed to warm slowly to room temperature over 2 hours. After stirring for 30 minutes at room temperature, the mixture is left at 0 ° C. overnight. After diluting with ethyl acetate, 10% hydrochloric acid is added to the reaction mixture to quench the reaction. The organic phase is washed with brine, dried (magnesium sulphate), solvent evaporated and [1S- (1α, 2
β, 3β)]-3-Hydroxy-1,2-cyclobutanedimethanol dibenzyl ether is obtained. TLC (5
0% ethyl acetate / hexane), Rf = 0.53.
【0022】実施例3 [1S−(1α,2β,3β)]−3−ヒドロキシ−
1,2−シクロブタンジメタノール・ジベンジルエーテ
ルの製造:−トルエン(2ml)中のトリイソブチルア
ルミニウム(0.91Mヘキサン溶液、0.9ml、0.
816ミリモル)の溶液に−40℃にて、トルエン(4
ml)中の(2S−トランス)−2,3−ビス[(ベン
ジルオキシ)メチル]シクロブタノン(0.2g、0.6
45ミリモル)の溶液を10分にわたって滴下する。混
合物を−50℃で4時間および−40℃で1時間撹拌す
る。反応混合物に、トリイソブチルアルミニウム溶液
(1ml、0.91ミリモル)を加える。30分間撹拌
後、−40℃にて10%塩酸(2ml)を加えて反応を
抑える。有機相を塩水で洗い、乾燥(硫酸マグネシウ
ム)し、溶媒蒸発して、[1S−(1α,2β,3
β)]−3−ヒドロキシ−1,2−シクロブタンジメタ
ノール・ジベンジルエーテルを得る。TLC(30%酢
酸エチル/ヘキサン),Rf=0.3。生成物は約5%
の異性体化合物を含有する。TLC(30%酢酸エチル
/ヘキサン),Rf=0.2。Example 3 [1S- (1α, 2β, 3β)]-3-hydroxy-
Preparation of 1,2-cyclobutane dimethanol dibenzyl ether: -triisobutylaluminum (0.91M solution in hexane, 0.9 ml, 0.9 ml) in toluene (2 ml).
816 mmol) in toluene (4
(2S-trans) -2,3-bis [(benzyloxy) methyl] cyclobutanone (0.2 g, 0.6) in
45 mmol) solution is added dropwise over 10 minutes. The mixture is stirred at −50 ° C. for 4 hours and −40 ° C. for 1 hour. To the reaction mixture was added triisobutylaluminum solution (1 ml, 0.91 mmol). After stirring for 30 minutes, 10% hydrochloric acid (2 ml) was added at -40 ° C to quench the reaction. The organic phase is washed with brine, dried (magnesium sulphate), solvent evaporated and [1S- (1α, 2β, 3
β)]-3-Hydroxy-1,2-cyclobutanedimethanol dibenzyl ether is obtained. TLC (30% ethyl acetate / hexane), Rf = 0.3. Product is about 5%
It contains an isomer compound. TLC (30% ethyl acetate / hexane), Rf = 0.2.
【0023】実施例4 [1S−(1α,2β,3β)]−3−ヒドロキシ−
1,2−シクロブタンジメタノール・ジベンジルエーテ
ルの製造:−イソプロパノール(3ml)中の(2S−
トランス)−2,3−ビス[(ベンジルオキシ)メチ
ル]シクロブタノン(0.25g、0.806ミリモ
ル)、イリジウムテトラクロリド(0.016g、0.0
483ミリモル)、亜リン酸(0.397g、4.84ミ
リモル)および水(0.3ml)の混合物を、一夜還流
する。溶媒を回転エバポレータで蒸発する。残渣を酢酸
エチルに溶かし、10%塩酸、塩水、および5%重炭酸
ナトリウムで連続して洗う。有機層を乾燥(硫酸マグネ
シウム)し、溶媒蒸発して、[1S−(1α,2β,3
β)]−3−ヒドロキシ−1,2−シクロブタンジメタ
ノール・ジベンジルエーテルを得る。TLC(40%酢
酸エチル/ヘキサン),Rf=0.51。Example 4 [1S- (1α, 2β, 3β)]-3-Hydroxy-
Preparation of 1,2-cyclobutane dimethanol dibenzyl ether: (2S- in isopropanol (3 ml)
Trans) -2,3-bis [(benzyloxy) methyl] cyclobutanone (0.25 g, 0.806 mmol), iridium tetrachloride (0.016 g, 0.0).
A mixture of 483 mmol), phosphorous acid (0.397 g, 4.84 mmol) and water (0.3 ml) is refluxed overnight. The solvent is evaporated on a rotary evaporator. The residue is dissolved in ethyl acetate and washed successively with 10% hydrochloric acid, brine and 5% sodium bicarbonate. The organic layer was dried (magnesium sulfate) and the solvent was evaporated to [1S- (1α, 2β, 3
β)]-3-Hydroxy-1,2-cyclobutanedimethanol dibenzyl ether is obtained. TLC (40% ethyl acetate / hexane), Rf = 0.51.
【0024】実施例5 (1α,2β,3β)−3−ヒドロキシ−1,2−シク
ロブタンジメタノール・ジベンゾエートエステルの製
造:−イソプロパノール(1ml)中のルテニウムブラ
ック(20mg)の懸濁液を、予め1気圧の水素下室温
で1時間水素添加する。この混合物に、イソプロパノー
ル(11ml)中の(トランス)−2,3−ビス[(ベ
ンゾイルオキシ)メチル]シクロブタノン(200m
g)を加え、コンバインした混合物を1気圧の水素下室
温で撹拌する。21時間後、HPLCにより、(1α,
2β,3β)−3−ヒドロキシ−1,2−シクロブタン
ジメタノール・ジベンゾエートエステルと、異性体化合
物の(1α,2β,3α)−3−ヒドロキシ−1,2−
シクロブタンジメタノール・ジベンゾエートエステルが
84:16の比率で存在することが認められる。Example 5 Preparation of (1α, 2β, 3β) -3-hydroxy-1,2-cyclobutanedimethanol dibenzoate ester: -A suspension of ruthenium black (20 mg) in isopropanol (1 ml), Preliminarily hydrogenate for 1 hour at room temperature under hydrogen at 1 atmosphere. To this mixture was added (trans) -2,3-bis [(benzoyloxy) methyl] cyclobutanone (200 m) in isopropanol (11 ml).
g) is added and the combined mixture is stirred at room temperature under 1 atm of hydrogen. After 21 hours, by HPLC (1α,
2β, 3β) -3-Hydroxy-1,2-cyclobutanedimethanol dibenzoate ester and the isomeric compound (1α, 2β, 3α) -3-hydroxy-1,2-
It is noted that the cyclobutane dimethanol dibenzoate ester is present in a ratio of 84:16.
【0025】実施例6 (1α,2β,3β)−3−ヒドロキシ−1,2−シク
ロブタンジメタノール・ジベンゾエートエステルの製
造:−メタノール(2ml)中の(トランス)−2,3
−ビス[(ベンゾイルオキシ)メチル]シクロブタノン
(50mg)および5%ルテニウム/アルミナ(10m
g)の混合物を、1気圧の水素下室温で撹拌する。46
時間後、HPLCにより、(1α,2β,3β)−3−
ヒドロキシ−1,2−シクロブタンジメタノール・ジベ
ンゾエートエステルと、異性体化合物の(1α,2β,
3α)−3−ヒドロキシ−1,2−シクロブタンジメタ
ノール・ジベンゾエートエステルが73:27の比率で
存在することが認められる。Example 6 Preparation of (1α, 2β, 3β) -3-hydroxy-1,2-cyclobutanedimethanol dibenzoate ester: (trans) -2,3 in methanol (2 ml)
-Bis [(benzoyloxy) methyl] cyclobutanone (50 mg) and 5% ruthenium / alumina (10 m
The mixture of g) is stirred at room temperature under 1 atm of hydrogen. 46
After hours, by HPLC, (1α, 2β, 3β) -3-
Hydroxy-1,2-cyclobutane dimethanol dibenzoate ester and isomer compounds (1α, 2β,
It is noted that the 3α) -3-hydroxy-1,2-cyclobutanedimethanol dibenzoate ester is present in the ratio 73:27.
【0026】実施例7 (1α,2β,3β)−3−ヒドロキシ−1,2−シク
ロブタンジメタノール・ジベンゾエートエステルの製
造:−トルエン(0.75ml)中の(トランス)−2,
3−ビス[(ベンゾイルオキシ)メチル]シクロブタノ
ン(50mg、0.148ミリモル)およびトリス−
(トリフェニルホスフィン)−ロジウム(I)クロリド
(1.4mg、0.0015ミリモル)の撹拌溶液に、ジ
フェニルシラン(27.4μl、0.148ミリモリ)を
滴下し、アルゴン雰囲気下室温で15分間保持する。次
いで、反応混合物を濃縮して油状物とし、触媒量のp−
トルエンスルホン酸を含有する10%水性メタノール
(1ml)と共に、室温で1時間撹拌する。混合物を濃
縮して油状物とし、これを水と酢酸エチル間に分配す
る。酢酸エチル層を飽和重炭酸ナトリウム水溶液および
塩水で洗い、無水硫酸ナトリウム上で乾燥し、溶媒を除
去して、55mgの透明油状物を得る。この油状物のH
PLCにより、(1α,2β,3β)−3−ヒドロキシ
−1,2−シクロブタンジメタノール・ジベンゾエート
エステルと、異性体化合物の(1α,2β,3α)−3
−ヒドロキシ−1,2−シクロブタンジメタノール・ジ
ベンゾエートエステルが82:18の比率で存在するこ
とが認められる。Example 7 Preparation of (1α, 2β, 3β) -3-hydroxy-1,2-cyclobutanedimethanol dibenzoate ester: (trans) -2, in toluene (0.75 ml)
3-bis [(benzoyloxy) methyl] cyclobutanone (50 mg, 0.148 mmol) and tris-
To a stirred solution of (triphenylphosphine) -rhodium (I) chloride (1.4 mg, 0.0015 mmol) was added diphenylsilane (27.4 μl, 0.148 millimoly) and kept at room temperature for 15 minutes under argon atmosphere. To do. The reaction mixture was then concentrated to an oil which contained a catalytic amount of p-
Stir for 1 hour at room temperature with 10% aqueous methanol containing toluene sulfonic acid (1 ml). The mixture is concentrated to an oil which is partitioned between water and ethyl acetate. The ethyl acetate layer is washed with saturated aqueous sodium bicarbonate solution and brine, dried over anhydrous sodium sulfate and the solvent removed to give 55 mg of a clear oil. H of this oil
By PLC, (1α, 2β, 3β) -3-hydroxy-1,2-cyclobutanedimethanol dibenzoate ester and the isomer compound (1α, 2β, 3α) -3
It is noted that the -hydroxy-1,2-cyclobutane dimethanol dibenzoate ester is present in the ratio 82:18.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 グレゴリー・エス・ビサッチ アメリカ合衆国ニュージャージー州ローレ ンスビル、テイラー・コート12133番 (72)発明者 リチャード・エイチ・ミュラー アメリカ合衆国ニュージャージー州リンゴ ーズ、リンドバーグ・ロード66番 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Gregory S. Visatch, Taylor Court 12133, Lawrenceville, NJ, USA (72) Inventor Richard H. Muller 66, Lindberg Road, Lingoles, NJ, USA
Claims (10)
置換基に対しシスの位置にあり、2つの−CH2−O−
Prot置換基は互いにトランスの位置にある)で示され
る化合物の製造法であって、式: 【化2】 の化合物を、ジアルキルアルミニウムクロリド、アルキ
ルアルミニウムジクロリド、トリアルキルアルミニウム
化合物、ルテニウムブラックまたはルテニウム/アルミ
ナ触媒の存在下の水素、トリス(トリフェニルホスフィ
ン)ロジウム(I)クロリドの存在下のジフェニルシラ
ン、および亜リン酸の存在下のイリジウムテトラクロリ
ドの群から選ばれる還元剤で処理し、ここで、アルキル
は炭素数1〜20の直鎖または分枝鎖基、Protはヒン
ダードシリル基、ベンジル、置換ベンジルまたは 【化3】 、R1は炭素数1〜6の直鎖または分枝鎖低級アルキル
またはフェニル、但し、還元剤がトリアルキルアルミニ
ウム化合物のとき、Protは 【化4】 ではないことを特徴とする製造法。1. The formula: (In the formula, the hydroxy substituent is the adjacent -CH 2 -O-Prot.
It is in the cis position with respect to the substituent and has two --CH 2 --O--
The Prot substituents are in the trans position relative to each other) for the preparation of compounds of formula: In the presence of dialkylaluminium chloride, alkylaluminum dichloride, trialkylaluminum compound, ruthenium black or ruthenium / alumina catalyst, diphenylsilane in the presence of tris (triphenylphosphine) rhodium (I) chloride, and Treated with a reducing agent selected from the group of iridium tetrachloride in the presence of phosphoric acid, where alkyl is a straight or branched chain group having 1 to 20 carbon atoms, Prot is a hindered silyl group, benzyl, substituted benzyl. Or [Chemical 3] , R 1 is a linear or branched lower alkyl having 1 to 6 carbon atoms or phenyl, provided that when the reducing agent is a trialkylaluminum compound, Prot is A manufacturing method characterized by not being.
ド、アルキルが炭素数3〜10の直鎖または分枝鎖基、
およびProtがt−ブチルジメチルシリル、t−ブチル
ジフェニルシリル、(トリフェニルメチル)ジメチルシ
リル、メチルジイソプロピルシリルおよびトリイソプロ
ピルシリルの群から選ばれるヒンダードシリル、もしく
はProtがベンジル、p−メトキシベンジルまたはベン
ゾイルである請求項1に記載の製造法。2. The reducing agent is a dialkylaluminum chloride, and the alkyl is a straight or branched chain group having 3 to 10 carbon atoms,
And Prot is a hindered silyl selected from the group of t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl, or Prot is benzyl, p-methoxybenzyl or benzoyl. The manufacturing method according to claim 1, wherein
リドおよびProtがベンゾイルであって、塩化メチレン
およびトルエンの群から選ばれる中性溶媒の存在下、約
−90℃〜溶媒沸点の温度で反応を行う請求項2に記載
の製造法。3. The reaction is carried out at a temperature of about −90 ° C. to the boiling point of the solvent in the presence of a reducing agent of diisobutylaluminum chloride and Prot of benzoyl in the presence of a neutral solvent selected from the group of methylene chloride and toluene. The manufacturing method according to 2.
ド、アルキルが炭素数3〜10の直鎖または分枝鎖基、
およびProtがt−ブチルジメチルシリル、t−ブチル
ジフェニルシリル、(トリフェニルメチル)ジメチルシ
リル、メチルジイソプロピルシリルおよびトリイソプロ
ピルシリルの群から選ばれるヒンダードシリル、もしく
はProtがベンジル、p−メトキシベンジルまたはベン
ゾイルである請求項1に記載の製造法。4. The reducing agent is alkylaluminum dichloride, and the alkyl is a linear or branched chain group having 3 to 10 carbon atoms,
And Prot is a hindered silyl selected from the group of t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl, or Prot is benzyl, p-methoxybenzyl or benzoyl. The manufacturing method according to claim 1, wherein
リドであって、塩化メチレンおよびトルエンの群から選
ばれる中性溶媒の存在下、約−90℃〜溶媒沸点の温度
で反応を行う請求項4に記載の製造法。5. The reaction according to claim 4, wherein the reducing agent is isobutylaluminum dichloride, and the reaction is carried out in the presence of a neutral solvent selected from the group of methylene chloride and toluene at a temperature of about −90 ° C. to the boiling point of the solvent. Manufacturing method.
物、アルキルが炭素数3〜10の直鎖または分枝鎖基、
およびProtがt−ブチルジメチルシリル、t−ブチル
ジフェニルシリル、(トリフェニルメチル)ジメチルシ
リル、メチルジイソプロピルシリルおよびトリイソプロ
ピルシリルの群から選ばれるヒンダードシリル、もしく
はProtがベンジルまたはp−メトキシベンジルである
請求項1に記載の製造法。6. The reducing agent is a trialkylaluminum compound, and the alkyl is a linear or branched group having 3 to 10 carbon atoms,
And Prot is a hindered silyl selected from the group of t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl, or Prot is benzyl or p-methoxybenzyl. The manufacturing method according to claim 1.
あって、塩化メチレンおよびトルエンの群から選ばれる
中性溶媒の存在下、約−90℃〜溶媒沸点の温度で反応
を行う請求項6に記載の製造法。7. The method according to claim 6, wherein the reducing agent is triisobutylaluminum, and the reaction is carried out in the presence of a neutral solvent selected from the group of methylene chloride and toluene at a temperature of about −90 ° C. to the boiling point of the solvent. Manufacturing method.
水素、およびProtがt−ブチルジメチルシリル、t−
ブチルジフェニルシリル、(トリフェニルメチル)ジメ
チルシリル、メチルジイソプロピルシリルおよびトリイ
ソプロピルシリルの群から選ばれるヒンダードシリル、
もしくはProtがベンジル、p−メトキシベンジルまた
はベンゾイルであって、メタノール、イソプロパノール
およびこれらの混合物の群から選ばれる溶媒中、約−9
0℃〜溶媒沸点の温度で反応を行うか;または還元剤が
ルテニウム/アルミニウムの存在下の水素、およびPro
tがt−ブチルジメチルシリル、t−ブチルジフェニル
シリル、(トリフェニルメチル)ジメチルシリル、メチ
ルジイソプロピルシリルおよびトリイソプロピルシリル
の群から選ばれるヒンダードシリル、もしくはProtが
ベンゾイルであって、メタノールおよびエタノールの群
から選ばれる溶媒中、約−90℃〜溶媒沸点の温度で反
応を行う請求項1に記載の製造法。8. The reducing agent is hydrogen in the presence of ruthenium black, and Prot is t-butyldimethylsilyl, t-.
Hindered silyl selected from the group of butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl,
Or Prot is benzyl, p-methoxybenzyl or benzoyl, in a solvent selected from the group of methanol, isopropanol and mixtures thereof, about -9
The reaction is carried out at a temperature between 0 ° C. and the boiling point of the solvent; or the reducing agent is hydrogen in the presence of ruthenium / aluminum, and Pro.
t is hindered silyl selected from the group of t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl, or Prot is benzoyl and The process according to claim 1, wherein the reaction is carried out in a solvent selected from the group at a temperature of about -90 ° C to the boiling point of the solvent.
ン)ロジウム(I)クロリドの存在下のジフェニルシラ
ン、およびProtがt−ブチルジメチルシリル、t−ブ
チルジフェニルシリル、(トリフェニルメチル)ジメチ
ルシリル、メチルジイソプロピルシリルおよびトリイソ
プロピルシリルの群から選ばれるヒンダードシリル、も
しくはProtがベンジル、p−メトキシベンジルまたは
ベンゾイルであって、ベンゼン、トルエン、ヘキサンお
よびシクロヘキサンの群から選ばれる溶媒中、約0℃〜
溶媒沸点の温度で反応を行うか、または溶媒非存在下、
約0〜120℃の温度で反応を行う請求項1に記載の製
造法。9. The reducing agent is diphenylsilane in the presence of tris (triphenylphosphine) rhodium (I) chloride, and Prot is t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyl. A hindered silyl selected from the group of diisopropylsilyl and triisopropylsilyl, or Prot is benzyl, p-methoxybenzyl or benzoyl in a solvent selected from the group of benzene, toluene, hexane and cyclohexane at about 0 ° C to
The reaction is carried out at the temperature of the boiling point of the solvent, or in the absence of the solvent,
The method according to claim 1, wherein the reaction is carried out at a temperature of about 0 to 120 ° C.
ムテトラクロリド、およびProtがt−ブチルジメチル
シリル、t−ブチルジフェニルシリル、(トリフェニル
メチル)ジメチルシリル、メチルジイソプロピルシリル
およびトリイソプロピルシリルの群から選ばれるヒンダ
ードシリル、もしくはProtがベンジル、p−メトキシ
ベンジルまたはベンゾイルであって、水、メタノール、
プロパノール、イソプロパノールおよびこれらの混合物
の群から選ばれる溶媒の存在下、約50〜100℃の温
度で反応を行う請求項1に記載の製造法。10. The reducing agent is iridium tetrachloride in the presence of phosphorous acid, and Prot is t-butyldimethylsilyl, t-butyldiphenylsilyl, (triphenylmethyl) dimethylsilyl, methyldiisopropylsilyl and triisopropylsilyl. Hindered silyl selected from the group, or Prot is benzyl, p-methoxybenzyl or benzoyl, water, methanol,
The process according to claim 1, wherein the reaction is carried out at a temperature of about 50 to 100 ° C. in the presence of a solvent selected from the group consisting of propanol, isopropanol and a mixture thereof.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/888,077 US5412134A (en) | 1992-05-26 | 1992-05-26 | Process for preparing diprotected 2,3-hydroxymethyl cyclobutanol |
| US888077 | 1992-05-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH069460A true JPH069460A (en) | 1994-01-18 |
Family
ID=25392481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5122495A Withdrawn JPH069460A (en) | 1992-05-26 | 1993-05-25 | Production of di-(protected 2,3-hydroxymethyl)cyclobutanol |
Country Status (18)
| Country | Link |
|---|---|
| US (2) | US5412134A (en) |
| EP (1) | EP0572209A2 (en) |
| JP (1) | JPH069460A (en) |
| KR (1) | KR930023320A (en) |
| CN (1) | CN1040426C (en) |
| AU (1) | AU656858B2 (en) |
| CA (1) | CA2096153A1 (en) |
| FI (1) | FI932396A7 (en) |
| HU (1) | HU212966B (en) |
| IL (1) | IL105655A (en) |
| MX (1) | MX9303025A (en) |
| NO (1) | NO179101C (en) |
| NZ (1) | NZ247574A (en) |
| PL (1) | PL172496B1 (en) |
| RU (1) | RU2118312C1 (en) |
| SG (1) | SG77537A1 (en) |
| TW (1) | TW234117B (en) |
| ZA (1) | ZA933223B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999016756A1 (en) * | 1997-09-29 | 1999-04-08 | Nippon Kayaku Kabushiki Kaisha | Process for the preparation of carbocyclic nucleoside derivatives and intermediates |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5412134A (en) * | 1992-05-26 | 1995-05-02 | E. R. Squibb & Sons, Inc. | Process for preparing diprotected 2,3-hydroxymethyl cyclobutanol |
| IL117574A0 (en) * | 1995-04-03 | 1996-07-23 | Bristol Myers Squibb Co | Processes for the preparation of cyclobutanone derivatives |
| JP3760254B2 (en) * | 1996-12-20 | 2006-03-29 | イハラケミカル工業株式会社 | Process for producing 1-alkoxy-1-trimethylsilyloxycyclopropanes |
| US8036428B2 (en) * | 2006-04-28 | 2011-10-11 | Pixart Imaging Inc. | Method and apparatus for detecting motion of image in optical navigator |
| IL229068A (en) | 2013-10-24 | 2016-06-30 | Amir Tsaliah | Apparatus and method for rapid deployment of a parachute |
| WO2021053670A1 (en) | 2019-09-20 | 2021-03-25 | Parazero Ltd. | Damage mitigating for an aerial vehicle having a deployable parachute |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US433897A (en) * | 1890-08-05 | Support for spinning-spindles | ||
| US2936324A (en) * | 1958-04-14 | 1960-05-10 | Eastman Kodak Co | Preparation of 2, 2, 4, 4-tetraalkylcyclobutane-1, 3-diols |
| US5723609A (en) * | 1988-03-30 | 1998-03-03 | E. R. Squibb & Sons, Inc. | Bis (hydroxymethyl) cyclobutyl purines |
| US5126345A (en) * | 1988-03-30 | 1992-06-30 | E. R. Squibb & Sons, Inc. | Bis (hydroxymethyl) cyclobutyl triazolopyrimidines |
| CN1022414C (en) * | 1988-09-09 | 1993-10-13 | 日本化药株式会社 | Process for preparation of cyclobutane derivatives |
| AU622926B2 (en) * | 1988-09-09 | 1992-04-30 | Nippon Kayaku Kabushiki Kaisha | Pyrimidine or purine cyclobutane derivatives |
| US5153352A (en) * | 1988-10-25 | 1992-10-06 | Bristol-Myers Squibb Company | Process for preparation of intermediates of carbocyclic nucleoside analogs |
| IL92096A0 (en) * | 1988-10-25 | 1990-07-12 | Abbott Lab | Carboxylic nucleoside analogs |
| US5064961A (en) * | 1989-12-18 | 1991-11-12 | E. R. Squibb & Sons, Inc. | Process for preparing an optically active cyclobutane nucleoside |
| US5235052A (en) * | 1990-04-16 | 1993-08-10 | Bristol-Myers Squibb Company | Process for preparing substituted cyclobutane purines |
| IE72143B1 (en) * | 1990-05-24 | 1997-03-26 | Squibb & Sons Inc | Process for preparing an optically active cyclobutanone an intermediate in the synthesis of an optically active cyclobutane nucleoside |
| US5185463A (en) * | 1991-10-02 | 1993-02-09 | E. R. Squibb & Sons, Inc. | Process for the preparation of an antiviral agent |
| US5412134A (en) * | 1992-05-26 | 1995-05-02 | E. R. Squibb & Sons, Inc. | Process for preparing diprotected 2,3-hydroxymethyl cyclobutanol |
-
1992
- 1992-05-26 US US07/888,077 patent/US5412134A/en not_active Expired - Fee Related
-
1993
- 1993-05-06 TW TW082103551A patent/TW234117B/zh active
- 1993-05-07 NZ NZ247574A patent/NZ247574A/en unknown
- 1993-05-07 ZA ZA933223A patent/ZA933223B/en unknown
- 1993-05-10 IL IL10565593A patent/IL105655A/en not_active IP Right Cessation
- 1993-05-13 CA CA002096153A patent/CA2096153A1/en not_active Abandoned
- 1993-05-24 MX MX9303025A patent/MX9303025A/en not_active IP Right Cessation
- 1993-05-25 JP JP5122495A patent/JPH069460A/en not_active Withdrawn
- 1993-05-25 RU RU93035828A patent/RU2118312C1/en active
- 1993-05-25 HU HU9301531A patent/HU212966B/en not_active IP Right Cessation
- 1993-05-25 SG SG1996002488A patent/SG77537A1/en unknown
- 1993-05-25 KR KR1019930009044A patent/KR930023320A/en not_active Abandoned
- 1993-05-25 AU AU38779/93A patent/AU656858B2/en not_active Ceased
- 1993-05-25 NO NO931897A patent/NO179101C/en unknown
- 1993-05-25 EP EP93304032A patent/EP0572209A2/en not_active Withdrawn
- 1993-05-26 CN CN93106381A patent/CN1040426C/en not_active Expired - Fee Related
- 1993-05-26 FI FI932396A patent/FI932396A7/en unknown
- 1993-05-26 PL PL93299081A patent/PL172496B1/en unknown
-
1994
- 1994-11-04 US US08/334,283 patent/US5516903A/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999016756A1 (en) * | 1997-09-29 | 1999-04-08 | Nippon Kayaku Kabushiki Kaisha | Process for the preparation of carbocyclic nucleoside derivatives and intermediates |
Also Published As
| Publication number | Publication date |
|---|---|
| NZ247574A (en) | 1994-08-26 |
| KR930023320A (en) | 1993-12-18 |
| PL299081A1 (en) | 1994-03-21 |
| HUT65115A (en) | 1994-04-28 |
| EP0572209A3 (en) | 1994-04-20 |
| NO931897D0 (en) | 1993-05-25 |
| AU656858B2 (en) | 1995-02-16 |
| SG77537A1 (en) | 2001-01-16 |
| NO179101C (en) | 1996-08-07 |
| CN1040426C (en) | 1998-10-28 |
| IL105655A (en) | 1996-07-23 |
| RU2118312C1 (en) | 1998-08-27 |
| AU3877993A (en) | 1993-12-02 |
| FI932396A0 (en) | 1993-05-26 |
| MX9303025A (en) | 1994-05-31 |
| IL105655A0 (en) | 1993-09-22 |
| PL172496B1 (en) | 1997-09-30 |
| HU9301531D0 (en) | 1993-09-28 |
| HU212966B (en) | 1996-12-30 |
| CA2096153A1 (en) | 1993-11-27 |
| FI932396A7 (en) | 1993-11-27 |
| US5516903A (en) | 1996-05-14 |
| TW234117B (en) | 1994-11-11 |
| ZA933223B (en) | 1993-12-08 |
| US5412134A (en) | 1995-05-02 |
| CN1082025A (en) | 1994-02-16 |
| NO931897L (en) | 1993-11-29 |
| EP0572209A2 (en) | 1993-12-01 |
| NO179101B (en) | 1996-04-29 |
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