MX2019006705A - Arreglos que incluyen una película de resina y una capa de polímero con patrón. - Google Patents
Arreglos que incluyen una película de resina y una capa de polímero con patrón.Info
- Publication number
- MX2019006705A MX2019006705A MX2019006705A MX2019006705A MX2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A
- Authority
- MX
- Mexico
- Prior art keywords
- resin film
- polymer layer
- epoxy resin
- poss
- discrete areas
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
- C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
- C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/24—Homopolymers or copolymers of amides or imides
- C09D133/26—Homopolymers or copolymers of acrylamide or methacrylamide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Proteomics, Peptides & Aminoacids (AREA)
- Zoology (AREA)
- Materials Engineering (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biotechnology (AREA)
- Physics & Mathematics (AREA)
- Microbiology (AREA)
- Molecular Biology (AREA)
- Genetics & Genomics (AREA)
- Biochemistry (AREA)
- Bioinformatics & Cheminformatics (AREA)
- General Engineering & Computer Science (AREA)
- Biophysics (AREA)
- General Chemical & Material Sciences (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Epoxy Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polyethers (AREA)
Abstract
Un ejemplo de un arreglo incluye un soporte, una película de resina de silsesquioxano poliédrico oligomérico (POSS) de epoxi reticulada en una superficie del soporte, y una capa de polímero hidrófobo patrón en la película de resina epoxi de POSS reticulada. La capa de polímero hidrófobo patrón define las áreas discretas expuestas de la película de resina epoxi de POSS reticulada, y una capa de polímero se une a las áreas discretas expuestas. Otro ejemplo de un arreglo incluye un soporte, una película de resina epoxi de POSS modificada en una superficie del soporte, y una capa de polímero hidrófobo patrón en la película de resina epoxi de POSS modificada. La película de resina epoxi de POSS modificada incluye un sitio de iniciación de crecimiento de polímero, y la capa de polímero hidrófobo patrón define áreas discretas expuestas de la película de resina epoxi de POSS modificada. Un cepillo de polímero se une al sitio de iniciación de crecimiento de polímero en las áreas discretas expuestas.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662438024P | 2016-12-22 | 2016-12-22 | |
| PCT/US2017/067557 WO2018119053A1 (en) | 2016-12-22 | 2017-12-20 | Arrays including a resin film and a patterned polymer layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2019006705A true MX2019006705A (es) | 2019-11-08 |
Family
ID=62625689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2019006705A MX2019006705A (es) | 2016-12-22 | 2017-12-20 | Arreglos que incluyen una película de resina y una capa de polímero con patrón. |
Country Status (16)
| Country | Link |
|---|---|
| US (4) | US11512339B2 (es) |
| EP (1) | EP3558511A4 (es) |
| JP (1) | JP7123928B2 (es) |
| KR (1) | KR102512186B1 (es) |
| CN (1) | CN110248725B (es) |
| AU (1) | AU2017382202B2 (es) |
| CA (1) | CA3046532A1 (es) |
| IL (1) | IL267444B2 (es) |
| MX (1) | MX2019006705A (es) |
| MY (1) | MY204003A (es) |
| PH (1) | PH12019501411A1 (es) |
| RU (1) | RU2760391C2 (es) |
| SA (1) | SA519402158B1 (es) |
| TW (1) | TWI757396B (es) |
| WO (1) | WO2018119053A1 (es) |
| ZA (1) | ZA201903898B (es) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10831102B2 (en) * | 2018-03-05 | 2020-11-10 | International Business Machines Corporation | Photoactive polymer brush materials and EUV patterning using the same |
| KR102698708B1 (ko) * | 2018-06-29 | 2024-08-26 | 일루미나, 인코포레이티드 | 플로우 셀 |
| US11884976B2 (en) * | 2018-07-20 | 2024-01-30 | Illumina, Inc. | Resin composition and flow cells incorporating the same |
| AU2019307637B2 (en) * | 2018-07-20 | 2024-12-19 | Illumina Cambridge Limited | Resin composition and flow cells incorporating the same |
| MX2020014066A (es) * | 2018-12-17 | 2021-05-27 | Illumina Inc | Celdas de flujo y kits de secuenciacion. |
| TWI857000B (zh) * | 2019-01-29 | 2024-10-01 | 美商伊路米納有限公司 | 流體槽以及將複合物引入至流體槽之方法 |
| TWI857001B (zh) | 2019-01-29 | 2024-10-01 | 美商伊路米納有限公司 | 定序套組 |
| TWI873119B (zh) | 2019-01-29 | 2025-02-21 | 美商伊路米納有限公司 | 流通槽及製備其之方法 |
| US20230061438A1 (en) | 2019-12-18 | 2023-03-02 | Roche Sequencing Solutions, Inc. | Methods of sequencing by synthesis using a consecutive labeling scheme |
| WO2021127357A2 (en) * | 2019-12-20 | 2021-06-24 | Illumina, Inc. | Flow cells |
| EP4214506A4 (en) * | 2020-09-15 | 2024-09-11 | 3M Innovative Properties Company | Nanopatterned films with patterned surface chemistry |
| US20220170918A1 (en) * | 2020-11-30 | 2022-06-02 | Palamedrix, Inc. | Substrate for single molecule organization |
| CA3199918A1 (en) * | 2021-01-05 | 2022-07-14 | Randall Smith | Compositions including functional groups coupled to substrates, and methods of making the same |
| KR20240004418A (ko) * | 2021-04-30 | 2024-01-11 | 일루미나 케임브리지 리미티드 | 플로우 셀 및 방법 |
| EP4562407A1 (en) * | 2022-07-27 | 2025-06-04 | Illumina, Inc. | Motion feedback using patterned flowcells |
| EP4590730A1 (en) * | 2022-09-19 | 2025-07-30 | Illumina, Inc. | Nanogel particles having dual functionality and temperature responsiveness for particle clustering in nucleic acid sequencing systems |
| WO2025122370A1 (en) * | 2023-12-04 | 2025-06-12 | W.R. Grace & Co.-Conn. | Polyol functionalized colloidal silica and methods of production |
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|---|---|---|---|---|
| EP0450060A1 (en) | 1989-10-26 | 1991-10-09 | Sri International | Dna sequencing |
| RU2041261C1 (ru) * | 1993-08-11 | 1995-08-09 | Институт молекулярной биологии им.В.А.Энгельгардта РАН | Способ изготовления матрицы для детектирования мисматчей |
| FR2729406B1 (fr) * | 1995-01-16 | 1997-04-18 | Rhone Poulenc Chimie | Utilisation a titre d'antiadherent et/ou d'hydrofugeant de polyorganosiloxanes fonctionnalises, greffes |
| US6391937B1 (en) | 1998-11-25 | 2002-05-21 | Motorola, Inc. | Polyacrylamide hydrogels and hydrogel arrays made from polyacrylamide reactive prepolymers |
| US6664061B2 (en) | 1999-06-25 | 2003-12-16 | Amersham Biosciences Ab | Use and evaluation of a [2+2] photoaddition in immobilization of oligonucleotides on a three-dimensional hydrogel matrix |
| US6372813B1 (en) | 1999-06-25 | 2002-04-16 | Motorola | Methods and compositions for attachment of biomolecules to solid supports, hydrogels, and hydrogel arrays |
| DE60131194T2 (de) | 2000-07-07 | 2008-08-07 | Visigen Biotechnologies, Inc., Bellaire | Sequenzbestimmung in echtzeit |
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| JP2004189840A (ja) * | 2002-12-10 | 2004-07-08 | Nippon Kayaku Co Ltd | 樹脂組成物及びその硬化物 |
| DE112004000333T5 (de) | 2003-02-26 | 2006-02-02 | Tokyo Ohka Kogyo Co., Ltd., Kawasaki | Silesquioxan-Harz, Positiv-Resist-Zusammensetzung, Resist-Laminat und Methode zur Bildung eines Resist-Musters |
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| KR20140004960A (ko) | 2012-07-03 | 2014-01-14 | 한국전자통신연구원 | 광경화성 폴리에틸렌글리콜 실세스퀴옥산, 이로부터 제조된 폴리에틸렌글리콜 실세스퀴옥산 네트워크, 이를 포함하는 항생물부착성 장치 및 나노 패턴의 제조방법 |
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| WO2016066586A1 (en) | 2014-10-31 | 2016-05-06 | Illumina Cambridge Limited | Novel polymers and dna copolymer coatings |
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| JP6516459B2 (ja) * | 2014-12-05 | 2019-05-22 | 東京応化工業株式会社 | 下地剤及び相分離構造を含む構造体の製造方法 |
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2017
- 2017-12-20 KR KR1020197021372A patent/KR102512186B1/ko active Active
- 2017-12-20 US US15/848,640 patent/US11512339B2/en active Active
- 2017-12-20 CN CN201780084858.2A patent/CN110248725B/zh active Active
- 2017-12-20 MX MX2019006705A patent/MX2019006705A/es unknown
- 2017-12-20 WO PCT/US2017/067557 patent/WO2018119053A1/en not_active Ceased
- 2017-12-20 EP EP17885079.8A patent/EP3558511A4/en active Pending
- 2017-12-20 JP JP2019530392A patent/JP7123928B2/ja active Active
- 2017-12-20 AU AU2017382202A patent/AU2017382202B2/en active Active
- 2017-12-20 MY MYPI2019003621A patent/MY204003A/en unknown
- 2017-12-20 CA CA3046532A patent/CA3046532A1/en active Pending
- 2017-12-20 RU RU2019117660A patent/RU2760391C2/ru active
- 2017-12-20 IL IL267444A patent/IL267444B2/en unknown
- 2017-12-22 TW TW106145313A patent/TWI757396B/zh active
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2019
- 2019-06-14 ZA ZA2019/03898A patent/ZA201903898B/en unknown
- 2019-06-19 PH PH12019501411A patent/PH12019501411A1/en unknown
- 2019-06-20 SA SA519402158A patent/SA519402158B1/ar unknown
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2022
- 2022-10-25 US US17/973,327 patent/US11932900B2/en active Active
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2024
- 2024-02-28 US US18/590,738 patent/US12398416B2/en active Active
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2025
- 2025-08-12 US US19/297,886 patent/US20250369034A1/en active Pending
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