[go: up one dir, main page]

Mathis et al., 1999 - Google Patents

Threading dislocation reduction mechanisms in low-temperature-grown GaAs

Mathis et al., 1999

View PDF
Document ID
16712853652404483053
Author
Mathis S
Wu X
Romanov A
Speck J
Publication year
Publication venue
Journal of applied physics

External Links

Snippet

In these studies, we have investigated the role of low-temperature growth in the reduction of threading dislocation (TD) densities in large mismatch heteroepitaxy. Low-and high- temperature (LT) and (HT) GaAs growths on highly mismatched substrates were used to find …
Continue reading at pubs.aip.org (PDF) (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/02546Arsenides
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/02543Phosphides
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02381Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/02433Crystal orientation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed

Similar Documents

Publication Publication Date Title
Mathis et al. Modeling of threading dislocation reduction in growing GaN layers
Chang et al. Crosshatched surface morphology in strained III‐V semiconductor films
Guha et al. Structural quality and the growth mode in epitaxial ZnSe/GaAs (100)
US5997638A (en) Localized lattice-mismatch-accomodation dislocation network epitaxy
Bringans et al. Effect of interface chemistry on the growth of ZnSe on the Si (100) surface
Mathis et al. Threading dislocation reduction mechanisms in low-temperature-grown GaAs
Igarashi Crystallographic Orientations and Interfacial Mismatches of Single‐Crystal CdS Films Deposited on Various Faces of Zinc‐Blende‐Type Materials
Pearsall et al. The growth of Ga x In1− x As on (100) InP by liquid‐phase epitaxy
Miles et al. High structural quality Ga1− x In x Sb/InAs strained‐layer superlattices grown on GaSb substrates
Wichrowska et al. Structural defects in MBE-grown CdTe-basing heterojunctions designed for photovoltaic applications
Bosch et al. Molecular beam epitaxy of InSb (110)
Wakahara et al. Surfactant effects of Sn on SiGeSi heteroepitaxy by molecular beam epitaxy
Babkevich et al. X-rayscattering, dislocations and orthorhombic GaSb
Schulte et al. Heteroepitaxy of GaAs on (001)⇒ 6° Ge substrates at high growth rates by hydride vapor phase epitaxy
Sidorov et al. Dislocations in CdTe heteroepitaxial structures on GaAs (301) and Si (301) substrates
Soga et al. Initial stage of epitaxial growth at the high temperature of GaAs and AlGaAs on Si by metalorganic chemical vapor deposition
Arpapay et al. The role of antiphase domain boundary density on the surface roughness of GaSb epilayers grown on Si (001) substrates
Lavrent'eva et al. Low-temperature molecular-beam epitaxy of GaAs: effect of excess arsenic on the structure and properties of the GaAs layers
Vilisova et al. Structure and properties of InGaAs layers grown by low-temperature molecular-beam epitaxy
Chen et al. Nucleation of misfit dislocations in In0. 2Ga0. 8As epilayers grown on GaAs substrates
Lavrent’eva et al. Low-temperature molecular beam epitaxy of GaAs: Influence of crystallization conditions on structure and properties of layers
Dura et al. Epitaxial growth of Sb/GaSb structures: An example of V/III‐V heteroepitaxy
Davis et al. Antiphase domain boundary suppression in chalcopyrite-on-sphalerite epitaxy
Grundmann Heterostructures
Wang et al. Liquid phase epitaxy SiGe films on a CVD-grown SiGe/Si (0 0 1) graded film