Nanoimprint-Based Processing of Nanomaterials for Electronic and Photonic Applications

Thirty years ago, the pioneering demonstration of nanoimprint lithography (NIL) unveiled a revolutionary path for nanofabrication. It promised a future where creating intricate nanostructures was not only possible but also scalable, cost-effective, and accessible beyond the confines of traditional cleanrooms. As we celebrate the 30th anniversary of this transformative technology, this Topical Collection reflects on its profound impact and eagerly anticipates its future.

NIL has matured into a cornerstone of nanotechnology, uniquely bridging the gap between groundbreaking academic research and high-volume industrial manufacturing. Its unparalleled ability to pattern a vast array of functional materials—from polymers and metal oxides to novel 2D materials and colloidal quantum dots—with high resolution and throughput has unlocked new paradigms in device engineering.

This collection, "Nanoimprint-based Processing of Nanomaterials for Electronic and Photonic Applications," seeks to capture the state-of-the-art at this pivotal moment. We invite contributions that explore the entire NIL ecosystem: from fundamental advances in stamp design, resist chemistry, and innovative processes (e.g., reverse, roll-to-roll, and thermal NIL), to the integration of novel nanomaterials for enhanced functionality.

We are particularly interested in research demonstrating NIL's critical role in realizing next-generation devices. This includes, but is not limited to, high-performance transistors and flexible electronics, nanophotonic devices and metasurfaces, advanced light-emitting diodes (LEDs) and lasers, high-efficiency photovoltaic cells, and novel sensors and bio-electronic interfaces.

By bringing together leading experts, this collection will serve as a milestone commemorating three decades of innovation and a vision map for the future. We welcome original research articles and reviews that highlight both the challenges and the immense opportunities that NIL presents for shaping the electronic and photonic technologies of tomorrow.

Keywords: Nanoimprint, Nanopatterning, Nanofabrication, Perovskite, 2D Materials, Transistors, Photodetectors, Light Emitters.

This Collection supports and amplifies research related to SDG 7, SDG 9.