Journal
Machine Vision and Applications
Sponsored by the International Association for Pattern Recognition, this journal publishes high-quality, technical contributions in machine vision research and development.
This special issue is in conjunction with the VISION workshop hosted at ICCV 2025 in Honolulu, Hawaii.
Papers are expected to include an extension of 30-40% new material and will be rigorously reviewed according to journal standards.
When this collection opens for submissions, you will be able to submit your manuscript through the participating journal.
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Juan Du
The Hong Kong University of Science and Technology (Guangzhou), and The Hong Kong University of Science and Technology -
Hao Yan
Arizona State University, Arizona, United States of America -
Shancong Mou
University of Minnesota, Twin Cities, Minnesota, United States of America -
Gokberk Cinbis
Middle East Technical University (METU), Türkiye -
Zirui (Ray) Liu
University of Minnesota, Twin Cities, Minnesota, United States of America